Austin, Texas
United States
32
2018-11-01
The entities that hold a legal rights for patent applications filed by inventor Rathsack Benjamen M.:
Benjamen M. Rathsack from Austin, US has applied for patents for these inventions. The list has both pending applications and granted patents:
Chemical amplification methods and techniques for developable bottom anti-reflective coatings and dyed implant resists
#2 | 2018-04-05Facilitation of spin-coat planarization over feature topography during substrate fabrication
#3 | 2017-08-24Photo-sensitized chemically amplified resist (PS-CAR) simulation
#4 | 2017-07-06Methods and techniques to use with photosensitized chemically amplified resist chemicals and processes
#5 | 2016-12-15LINE PATTERN COLLAPSE MITIGATION THROUGH GAP-FILL MATERIAL APPLICATION
#6 | 2016-12-08Techniques for Spin-on-Carbon Planarization
#7 | 2016-11-24Use of grapho-epitaxial directed self-assembly applications to precisely cut logic lines
#8 | 2016-10-13Subtractive methods for creating dielectric isolation structures within open features
#9 | 2016-10-13Using sub-resolution openings to aid in image reversal, directed self-assembly, and selective deposition
#10 | 2016-09-15Use of topography to direct assembly of block copolymers in grapho-epitaxial applications
#11 | 2016-05-19SUBSTRATE BACKSIDE TEXTURING
#12 | 2016-02-11Substrate backside texturing
#13 | 2016-01-14Integration of absorption based heating bake methods into a photolithography track system
#14 | 2015-08-27Metrology for measurement of photosensitizer concentration within photo-sensitized chemically-amplified resist (PS-CAR)
#15 | 2015-08-27Methods and techniques to use with photosensitized chemically amplified resist chemicals and processes
#16 | 2015-08-27Chemical amplification methods and techniques for developable bottom anti-reflective coatings and dyed implant resists
#17 | 2015-05-07Line pattern collapse mitigation through gap-fill material application
#18 | 2015-04-23Use of topography to direct assembly of block copolymers in grapho-epitaxial applications
#19 | 2015-04-23Use of topography to direct assembly of block copolymers in grapho-epitaxial applications
#20 | 2015-04-23Use of grapho-epitaxial directed self-assembly to precisely cut lines
#21 | 2015-02-12Substrate backside texturing
#22 | 2014-09-18INTEGRATION OF ABSORPTION BASED HEATING BAKE METHODS INTO A PHOTOLITHOGRAPHY TRACK SYSTEM
#23 | 2014-09-18Multi-step bake apparatus and method for directed self-assembly lithography control
#24 | 2014-09-18Multi-step bake apparatus and method for directed self-assembly lithography control
#25 | 2014-09-18Topography minimization of neutral layer overcoats in directed self-assembly applications
#26 | 2014-05-29Controlling cleaning of a layer on a substrate using nozzles
#27 | 2013-11-21Method of forming patterns using block copolymers and articles thereof
#28 | 2013-05-02METHOD OF SLIMMING RADIATION-SENSITIVE MATERIAL LINES IN LITHOGRAPHIC APPLICATIONS
#29 | 2012-09-27Electrostatic post exposure bake apparatus and method
#30 | 2011-09-29Simplified micro-bridging and roughness analysis
#31 | 2011-08-25Line pattern collapse mitigation through gap-fill material application
#32 | 2009-06-04Enhanced process yield using a hot-spot library
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