Austin, Texas
United States
34
2020-02-27
The entities that hold a legal rights for patent applications filed by inventor Somervell Mark H.:
Mark H. Somervell from Austin, US has applied for patents for these inventions. The list has both pending applications and granted patents:
UV-assisted stripping of hardened photoresist to create chemical templates for directed self-assembly
#2 | 2019-03-28Methods for sensitizing photoresist using flood exposures
#3 | 2018-11-01Chemical amplification methods and techniques for developable bottom anti-reflective coatings and dyed implant resists
#4 | 2018-04-05Facilitation of spin-coat planarization over feature topography during substrate fabrication
#5 | 2017-08-24Photo-sensitized chemically amplified resist (PS-CAR) simulation
#6 | 2016-12-15LINE PATTERN COLLAPSE MITIGATION THROUGH GAP-FILL MATERIAL APPLICATION
#7 | 2016-12-08Techniques for Spin-on-Carbon Planarization
#8 | 2016-11-24Use of grapho-epitaxial directed self-assembly applications to precisely cut logic lines
#9 | 2016-10-13Subtractive methods for creating dielectric isolation structures within open features
#10 | 2016-10-13Using sub-resolution openings to aid in image reversal, directed self-assembly, and selective deposition
#11 | 2016-09-15Use of topography to direct assembly of block copolymers in grapho-epitaxial applications
#12 | 2016-01-14Integration of absorption based heating bake methods into a photolithography track system
#13 | 2015-08-27Metrology for measurement of photosensitizer concentration within photo-sensitized chemically-amplified resist (PS-CAR)
#14 | 2015-08-27Chemical amplification methods and techniques for developable bottom anti-reflective coatings and dyed implant resists
#15 | 2015-08-27Mitigation of EUV shot noise replicating into acid shot noise in photo-sensitized chemically-amplified resist (PS-CAR)
#16 | 2015-05-07Line pattern collapse mitigation through gap-fill material application
#17 | 2015-04-23Use of topography to direct assembly of block copolymers in grapho-epitaxial applications
#18 | 2015-04-23Use of topography to direct assembly of block copolymers in grapho-epitaxial applications
#19 | 2015-04-23Use of grapho-epitaxial directed self-assembly to precisely cut lines
#20 | 2014-10-02METHODS FOR CONTROLLING ACROSS-WAFER DIRECTED SELF-ASSEMBLY
#21 | 2014-09-18INTEGRATION OF ABSORPTION BASED HEATING BAKE METHODS INTO A PHOTOLITHOGRAPHY TRACK SYSTEM
#22 | 2014-09-18Topography minimization of neutral layer overcoats in directed self-assembly applications
#23 | 2014-09-18Track processing to remove organic films in directed self-assembly chemo-epitaxy applications
#24 | 2014-09-18SOLVENT ANNEAL PROCESSING FOR DIRECTED-SELF ASSEMBLY APPLICATIONS
#25 | 2014-09-18Chemi-epitaxy in directed self-assembly applications using photo-decomposable agents
#26 | 2013-11-21Method of forming patterns using block copolymers and articles thereof
#27 | 2013-05-02METHOD OF SLIMMING RADIATION-SENSITIVE MATERIAL LINES IN LITHOGRAPHIC APPLICATIONS
#28 | 2011-11-03Substrate treatment to reduce pattern roughness
#29 | 2011-10-06Method of slimming radiation-sensitive material lines in lithographic applications
#30 | 2011-10-06Method of slimming radiation-sensitive material lines in lithographic applications
#31 | 2011-10-06Composition and method for reducing pattern collapse
#32 | 2011-08-25Line pattern collapse mitigation through gap-fill material application
#33 | 2009-10-01Method of creating a graded anti-reflective coating
#34 | 2009-10-01SUBSTRATE CLEANING METHOD AND APPARATUS
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