Sharon Aharon

City:

Hanaton

Country:

Israel

Published Applications:

Last publication date:

2023-03-30

Top Assignees for applications by Sharon Aharon

The entities that hold a legal rights for patent applications filed by inventor Aharon Sharon:

Sharon Aharon from Hanaton, IL has applied for patents for these inventions. The list has both pending applications and granted patents:

Reduction or elimination of pattern placement error in metrology measurements

Reduction or elimination of pattern placement error in metrology measurements

Parameter-stable misregistration measurement amelioration in semiconductor devices

REDUCTION OR ELIMINATION OF PATTERN PLACEMENT ERROR IN METROLOGY MEASUREMENTS

Determining the impacts of stochastic behavior on overlay metrology data

Process compatibility improvement by fill factor modulation

InventorID:

2209154 ⎘