Aalen
Germany
25
2026-03-12
The entities that hold a legal rights for patent applications filed by inventor GRUNER Toralf:
Toralf GRUNER from Aalen, DE has applied for patents for these inventions. The list has both pending applications and granted patents:
METHOD FOR PRODUCING AN OPTICAL IMAGING SYSTEM FOR A MICROLITHOGRAPHY APPARATUS
#2 | 2025-07-03METHOD FOR OPERATING A PROJECTION EXPOSURE SYSTEM
#3 | 2025-02-06OPTICAL COMPONENT FOR A LITHOGRAPHY APPARATUS
#4 | 2024-08-29OPTICAL SYSTEM, PROJECTION EXPOSURE SYSTEM AND METHOD
#5 | 2023-11-16METHOD OF SETTING UP A PROJECTION EXPOSURE SYSTEM, A PROJECTION EXPOSURE METHOD AND A PROJECTION EXPOSURE SYSTEM FOR MICROLITHOGRAPHY
#6 | 2023-10-12OPTICAL SYSTEM, AND METHOD FOR OPERATING AN OPTICAL SYSTEM
#7 | 2023-04-20Mirror, in particular for a microlithographic projection exposure apparatus
#8 | 2022-07-28Method and device for characterizing the surface shape of an optical element
#9 | 2022-04-14Mirror, in particular for a microlithographic projection exposure apparatus
#10 | 2021-05-20Mirror for a microlithographic projection exposure apparatus, and method for operating a deformable mirror
#11 | 2021-02-25Mirror, in particular for a microlithographic projection exposure system
#12 | 2020-12-17Optical element, and method for correcting the wavefront effect of an optical element
#13 | 2020-06-04Mirror, in particular for a microlithographic projection exposure system
#14 | 2020-01-23Mirror, in particular for a microlithographic projection exposure apparatus
#15 | 2019-04-11PROJECTION LENS WITH A MEASUREMENT BEAM PATH
#16 | 2018-06-14Mirror arrangement for lithography exposure apparatus and optical system comprising mirror arrangement
#17 | 2008-08-14Projection exposure system, method for manufacturing a micro-structured structural member by the aid of such a projection exposure system and polarization-optical element adapted for use in such a system
#18 | 2006-11-02Device for adjusting the illumination dose on a photosensitive layer
#19 | 2006-09-28Objective in a microlithographic projection exposure apparatus
#20 | 2006-07-06Method for improving the imaging properties of at least two optical elements and photolithographic fabrication method
#21 | 2006-06-08Optical system for ultraviolet light
#22 | 2005-11-17Method for improving the imaging properties of at least two optical elements and photolithographic fabrication method
#23 | 2005-08-04Lens made of a crystalline material
#24 | 2005-01-27Projection lens for a microlithographic projection exposure apparatus
#25 | 2005-01-06Microlithographic illumination method and a projection lens for carrying out the method
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