Abhishek Dube

Extremely Thin Semiconductor-On-Insulator Field-Effect Transistor With An Epitaxial Source And Drain Having A Low External Resistance

EXTREMELY THIN SEMICONDUCTOR-ON-INSULATOR FIELD-EFFECT TRANSISTOR WITH AN EPITAXIAL SOURCE AND DRAIN HAVING A LOW EXTERNAL RESISTANCE

Field effect transistor device

Method for growing conformal EPI layers and structure thereof

Method for growing strain-inducing materials in CMOS circuits in a gate first flow

SILICON GERMANIUM FILM FORMATION METHOD AND STRUCTURE

Semiconductor structure having test and transistor structures

Cavity-free interface between extension regions and embedded silicon-carbon alloy source/drain regions

Monolayer dopant embedded stressor for advanced CMOS

Reduced pattern loading for doped epitaxial process and semiconductor structure

Silicon germanium film formation method and structure

Stressed transistor with improved metastability

Process for epitaxially growing epitaxial material regions

Method for growing strain-inducing materials in CMOS circuits in a gate first flow

Structure and method for increasing strain in a device

Epitaxial growth of silicon doped with carbon and phosphorus using hydrogen carrier gas

Field effect transistor device

Delta monolayer dopants epitaxy for embedded source/drain silicide

Monolayer dopant embedded stressor for advanced CMOS

Method of forming source and drain of a field-effect-transistor and structure thereof

Pattern independent Si:C selective epitaxy

POLYGRAIN ENGINEERING BY ADDING IMPURITIES IN THE GAS PHASE DURING CHEMICAL VAPOR DEPOSITION OF POLYSILICON

METHOD FOR FORMING CARBON SILICON ALLOY (CSA) AND STRUCTURES THEREOF