Tooru KIMURA

City:

Tokyo

Country:

Japan

Published Applications:

Last publication date:

2016-03-24

Top Assignees for applications by Tooru KIMURA

The entities that hold a legal rights for patent applications filed by inventor KIMURA Tooru:

JSR Corporation 8 Tokyo, Japan
JSR Corportion 1 Tokyo, Japan
JSR CORPORATION 1 Tokyo, Taiwan
Sony Corporation 1 , Japan

Recent patent applications by KIMURA Tooru

Tooru KIMURA from Tokyo, JP has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2016-03-24

US20160085152A1

Physics

Composition for film formation, resist underlayer film and forming method thereof, pattern-forming method and compound

#2 | 2013-10-03

US20130256264A1

Physics

Composition for forming resist underlayer film, and pattern-forming method

#3 | 2013-09-12

US20130233826A1

Physics

Composition for forming resist underlayer film, and pattern-forming method

#4 | 2013-09-12

US20130233825A1

Physics

Composition for forming resist underlayer film and pattern-forming method

#5 | 2013-05-02

US20130108965A1

Physics

RADIATION-SENSITIVE COMPOSITION

#6 | 2012-11-08

US20120282550A1

Physics

Radiation-sensitive composition

#7 | 2008-06-03

US10847360

Fan motor

#8 | 2007-08-16

US20070190450A1

Physics

Negative radiation-sensitive resin composition

#9 | 2006-11-28

US10477207

Radiation-sensitive resin composition

#10 | 2006-09-21

US20060210912A1

Physics

Photosensitive resin film and cured film made therefrom

InventorID:

222756 ⎘