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Inventor profile of:

Basoene Briggs

City:

Heverlee

Country:

Belgium

Published Applications:

9

Last publication date:

2024-01-04

Top Assignees for applications by Basoene Briggs

The entities that hold a legal rights for patent applications filed by inventor Briggs Basoene:

  • IMEC VZW 7 Leuven, Belgium
  • Katholieke Universiteit Leuven 1 Leuven, Belgium

Recent patent applications by Briggs Basoene

Basoene Briggs from Heverlee, BE has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2024-01-04
US20240006228A1
Electricity

Method for forming a buried metal line in a semiconductor substrate

#2 | 2023-06-22
US20230197525A1
Electricity

Method for Forming a Semiconductor Device Structure

#3 | 2022-03-03
US20220068725A1
Electricity

Method for forming transistor structures

#4 | 2021-10-28
US20210336057A1
Electricity

STRAINED SEMICONDUCTOR MONOCRYSTALLINE NANOSTRUCTURE

#5 | 2021-01-28
US20210028106A1
Electricity

Method of forming a multi-level interconnect structure in a semiconductor device

#6 | 2021-01-28
US20210028059A1
Electricity

Method for Forming a Buried Metal Line in a Semiconductor Substrate

#7 | 2020-01-23
US20200027780A1
Electricity

Method for forming a multi-level interconnect structure

#8 | 2018-11-15
US20180330986A1
Electricity

Method of patterning target layer

#9 | 2018-08-30
US20180247863A1
Electricity

Method of patterning target layer

InventorID:

2283594 ⎘

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