Inventor profile of:

MUHAMMAD RASHEED

City:

San Jose, California

Country:

United States

Published Applications:

26

Last publication date:

2024-06-06

Top Assignees for applications by MUHAMMAD RASHEED

The entities that hold a legal rights for patent applications filed by inventor RASHEED MUHAMMAD:

Recent patent applications by RASHEED MUHAMMAD

MUHAMMAD RASHEED from San Jose, US has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2024-06-06
US20240186128A1
Electricity

METHODS AND APPARATUS FOR REDUCING SPUTTERING OF A GROUNDED SHIELD IN A PROCESS CHAMBER

#2 | 2020-10-01
US20200312640A1
Electricity

Methods and apparatus for reducing sputtering of a grounded shield in a process chamber

#3 | 2019-11-21
US20190351433A1
Performing operations; transporting

Multi-zone showerhead

#4 | 2018-03-29
US20180087147A1
Chemistry; metallurgy

Process kit shield for improved particle reduction

#5 | 2018-01-11
US20180010242A1
Chemistry; metallurgy

DEPOSITION RING AND ELECTROSTATIC CHUCK FOR PHYSICAL VAPOR DEPOSITION CHAMBER

#6 | 2017-03-30
US20170088942A1
Chemistry; metallurgy

PROCESS KIT SHIELD AND PHYSICAL VAPOR DEPOSITION CHAMBER HAVING SAME

#7 | 2016-11-24
US20160340775A1
Chemistry; metallurgy

Deposition ring and electrostatic chuck for physical vapor deposition chamber

#8 | 2016-10-06
US20160293798A1
Electricity

PVD buffer layers for LED fabrication

#9 | 2014-09-18
US20140262764A1
Chemistry; metallurgy

Methods and apparatus for reducing sputtering of a grounded shield in a process chamber

#10 | 2014-09-18
US20140261180A1
Chemistry; metallurgy

PVD target for self-centering process shield

#11 | 2014-09-18
US20140261177A1
Chemistry; metallurgy

Apparatus for gas injection in a physical vapor deposition chamber

#12 | 2014-09-18
US20140260544A1
Physics

Method and apparatus for measuring pressure in a physical vapor deposition chamber

#13 | 2014-09-11
US20140251217A1
Electricity

Target for PVD sputtering system

#14 | 2014-06-12
US20140158049A1
Chemistry; metallurgy

Process kit shield for plasma enhanced processing chamber

#15 | 2013-10-31
US20130285065A1
Electricity

PVD buffer layers for LED fabrication

#16 | 2013-10-24
US20130277203A1
Chemistry; metallurgy

PROCESS KIT SHIELD AND PHYSICAL VAPOR DEPOSITION CHAMBER HAVING SAME

#17 | 2013-10-03
US20130256127A1
Chemistry; metallurgy

Substrate processing system having symmetric RF distribution and return paths

#18 | 2013-10-03
US20130256125A1
Chemistry; metallurgy

Substrate processing system with mechanically floating target assembly

#19 | 2013-10-03
US20130255576A1
Electricity

Process kit shield for plasma enhanced processing chamber

#20 | 2013-06-20
US20130153412A1
Chemistry; metallurgy

Apparatus for enabling concentricity of plasma dark space

#21 | 2013-05-09
US20130112554A1
Chemistry; metallurgy

DEPOSITION RING AND ELECTROSTATIC CHUCK FOR PHYSICAL VAPOR DEPOSITION CHAMBER

#22 | 2012-05-03
US20120103257A1
Chemistry; metallurgy

Deposition ring and electrostatic chuck for physical vapor deposition chamber

#23 | 2012-02-02
US20120027954A1
Electricity

MAGNET FOR PHYSICAL VAPOR DEPOSITION PROCESSES TO PRODUCE THIN FILMS HAVING LOW RESISTIVITY AND NON-UNIFORMITY

#24 | 2011-12-22
US20110311735A1
Chemistry; metallurgy

Magnetron design for RF/DC physical vapor deposition

#25 | 2011-11-17
US20110278165A1
Chemistry; metallurgy

Process kit shield for improved particle reduction

#26 | 2011-10-06
US20110240464A1
Electricity

Apparatus for physical vapor deposition having centrally fed RF energy

InventorID:

229789 ⎘