Inventor profile of:

Reinder Teun PLUG

City:

Eindhoven

Country:

Netherlands

Published Applications:

15

Last publication date:

2022-02-17

Top Assignees for applications by Reinder Teun PLUG

The entities that hold a legal rights for patent applications filed by inventor PLUG Reinder Teun:

Recent patent applications by PLUG Reinder Teun

Reinder Teun PLUG from Eindhoven, NL has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2022-02-17
US20220050391A1
Physics

METHODS AND APPARATUS FOR ESTIMATING SUBSTRATE SHAPE

#2 | 2021-02-11
US20210041788A1
Physics

Guided patterning device inspection

#3 | 2019-08-01
US20190235394A1
Physics

METHOD OF PATTERNING AT LEAST A LAYER OF A SEMICONDUCTOR DEVICE

#4 | 2018-11-01
US20180314160A1
Physics

Method and apparatus for predicting performance of a metrology system

#5 | 2011-02-24
US20110043791A1
Physics

Metrology method and apparatus, lithographic apparatus, device manufacturing method and substrate

#6 | 2009-12-03
US20090296081A1
Physics

Metrology tool, system comprising a lithographic apparatus and a metrology tool, and a method for determining a parameter of a substrate

#7 | 2008-06-26
US20080148875A1
Physics

Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method

#8 | 2008-06-19
US20080145791A1
Electricity

Lithographic apparatus, combination of lithographic apparatus and processing module, and device manufacturing method

#9 | 2008-06-19
US20080143985A1
Physics

Lithography system, control system and device manufacturing method

#10 | 2008-02-14
US20080036983A1
Physics

Lithography system, control system and device manufacturing method

#11 | 2008-01-03
US20080002207A1
Physics

Apparatus for angular-resolved spectroscopic lithography characterization and device manufacturing method

#12 | 2007-12-06
US20070279742A1
Physics

Metrology tool, system comprising a lithographic apparatus and a metrology tool, and a method for determining a parameter of a substrate

#13 | 2007-12-06
US20070279644A1
Physics

Metrology tool, system comprising a lithographic apparatus and a metrology tool, and a method for determining a parameter of a substrate

#14 | 2007-08-09
US20070182964A1
Physics

Lithographic system, sensor, and method of measuring properties of a substrate

#15 | 2005-03-17
US20050058446A1
Physics

Method, apparatus and computer product for substrate processing

InventorID:

2337783 ⎘