Eindhoven
Netherlands
22
2025-05-22
The entities that hold a legal rights for patent applications filed by inventor SMAKMAN Erwin Paul:
Erwin Paul SMAKMAN from Eindhoven, NL has applied for patents for these inventions. The list has both pending applications and granted patents:
SEM IMAGE ENHANCEMENT METHODS AND SYSTEMS
#2 | 2024-10-10CHARGED-PARTICLE OPTICAL APPARATUS AND PROJECTION METHOD
#3 | 2024-10-10CHARGED PARTICLE DEVICE, CHARGED PARTICLE ASSESSMENT APPARATUS, MEASURING METHOD, AND MONITORING METHOD
#4 | 2024-10-03CHARGED-PARTICLE APPARATUS, MULTI-DEVICE APPARATUS, METHOD OF USING CHARGED-PARTICLE APPARATUS AND CONTROL METHOD
#5 | 2024-06-06METHOD AND APPARATUS FOR INSPECTION
#6 | 2024-04-18CHARGED PARTICLE APPARATUS AND METHOD
#7 | 2023-10-12CHARGED PARTICLE TOOL, CALIBRATION METHOD, INSPECTION METHOD
#8 | 2023-05-18Pulsed charged-particle beam system
#9 | 2023-02-16APPARATUS FOR AND METHOD OF CONTROL OF A CHARGED PARTICLE BEAM
#10 | 2022-12-08Systems and methods of profiling charged-particle beams
#11 | 2022-05-12Apparatus for and method of controlling an energy spread of a charged-particle beam
#12 | 2021-12-02Method and apparatus for inspection
#13 | 2021-08-12ELECTRON BEAM APPARATUS, INSPECTION TOOL AND INSPECTION METHOD
#14 | 2021-02-25Inspection system, lithographic apparatus, and inspection method
#15 | 2020-10-01Aperture array with integrated current measurement
#16 | 2020-08-06Inspection tool, lithographic apparatus, electron beam source and an inspection method
#17 | 2020-01-16SEM IMAGE ENHANCEMENT METHODS AND SYSTEMS
#18 | 2019-11-07Determining the combination of patterns to be applied to a substrate in a lithography step
#19 | 2019-07-25Apparatus for direct write maskless lithography
#20 | 2019-01-10Method and apparatus for direct write maskless lithography
#21 | 2019-01-03Method and apparatus for inspection
#22 | 2018-12-27Method and apparatus for direct write maskless lithography
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