Eindhoven
Netherlands
16
2024-11-07
The entities that hold a legal rights for patent applications filed by inventor VAN DIJK Leon Paul:
Leon Paul VAN DIJK from Eindhoven, NL has applied for patents for these inventions. The list has both pending applications and granted patents:
METHODS AND COMPUTER PROGRAMS FOR DATA MAPPING FOR LOW DIMENSIONAL DATA ANALYSIS
#2 | 2023-08-03Method for adjusting a target feature in a model of a patterning process based on local electric fields
#3 | 2022-03-17Apparatus and method for property joint interpolation and prediction
#4 | 2022-02-17Method for adjusting a target feature in a model of a patterning process based on local electric fields
#5 | 2021-06-03Metrology apparatus
#6 | 2021-02-18Alignment mark positioning in a lithographic process
#7 | 2021-01-21Determining an optimal operational parameter setting of a metrology system
#8 | 2020-10-01Focus and overlay improvement by modifying a patterning device
#9 | 2020-07-09Methods and apparatus for use in a device manufacturing method
#10 | 2020-02-13Methods of determining stress in a substrate, control system for controlling a lithographic process, lithographic apparatus and computer program product
#11 | 2019-09-26METHOD OF DETERMINING PELLICLE COMPENSATION CORRECTIONS FOR A LITHOGRAPHIC PROCESS, METROLOGY APPARATUS AND COMPUTER PROGRAM
#12 | 2019-09-19Method to change an etch parameter
#13 | 2019-08-15Determining an optimal operational parameter setting of a metrology system
#14 | 2019-03-14Lithographic apparatus, device manufacturing method and associated data processing apparatus and computer program product
#15 | 2019-02-07METHODS OF DETERMINING A MECHANICAL PROPERTY OF A LAYER APPLIED TO A SUBSTRATE, CONTROL SYSTEM FOR A LITHOGRAPHIC APPARATUS AND LITHOGRAPHIC APPARATUS
#16 | 2018-12-06Lithographic apparatus and device manufacturing method
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