Austin, Texas
United States
48
2026-05-28
The entities that hold a legal rights for patent applications filed by inventor Lane Barton:
Barton Lane from Austin, US has applied for patents for these inventions. The list has both pending applications and granted patents:
DEPOSITION METHODS USING PULSED PLASMA WITH VARYING PULSE FREQUENCY
#2 | 2026-03-12APPARATUS FOR EDGE CONTROL DURING PLASMA PROCESSING
#3 | 2026-03-05HYBRID PLASMA SOURCE
#4 | 2026-02-12APPARATUS FOR PLASMA PROCESSING
#5 | 2025-12-25PLASMA PROCESSING WITH MAGNETIC RING X POINT
#6 | 2025-09-18SYSTEM AND METHOD OF PULSE SCORING
#7 | 2025-08-28RESONANT PHASE-CONTROLLED OSCILLATOR
#8 | 2025-08-28PLASMA ADJUSTMENT USING SOURCE-LESS RESONANT STRUCTURE
#9 | 2025-08-28RADIO FREQUENCY SENSOR CALIBRATION BY VIRTUAL METROLOGY
#10 | 2025-05-22METHOD AND SYSTEM FOR PLASMA PROCESS
#11 | 2025-04-24Method and System for Plasma Process
#12 | 2025-02-27METHOD FOR PLASMA PROCESSING
#13 | 2025-01-30APPARATUS AND METHOD FOR PLASMA PROCESSING
#14 | 2025-01-16PLASMA PROCESSING METHOD AND APPARATUS
#15 | 2025-01-09APPARATUS FOR PLASMA PROCESSING
#16 | 2024-11-14Parallel Resonance Antenna for Radial Plasma Control
#17 | 2024-08-01Antenna Plane Magnets for Improved Performance
#18 | 2024-06-27System and Method for Plasma Processing
#19 | 2024-06-20IN-SITU DIAGNOSIS OF PLASMA SYSTEM
#20 | 2024-05-16Parallel resonance antenna for radial plasma control
#21 | 2024-02-01Plasma Processing with Magnetic Ring X Point
#22 | 2024-02-01RF voltage and current (V-I) sensors and measurement methods
#23 | 2023-12-14Equipment and Method for Improved Edge Uniformity of Plasma Processing of Wafers
#24 | 2023-11-23Apparatus for plasma processing
#25 | 2023-11-09Apparatus for Edge Control During Plasma Processing
#26 | 2023-09-07APPARATUS FOR PLASMA PROCESSING
#27 | 2023-05-04Radio frequency (RF) system with embedded RF signal pickups
#28 | 2023-02-23Apparatus for Plasma Processing
#29 | 2022-03-10Impedance matching apparatus and control method
#30 | 2021-12-30RF voltage and current (V-I) sensors and measurement methods
#31 | 2021-12-30RF measurement system and method
#32 | 2021-12-30RF voltage and current (V-I) sensors and measurement methods
#33 | 2021-08-12Plasma Processing System with Synchronized Signal Modulation
#34 | 2021-03-18Plasma processing apparatuses including multiple electron sources
#35 | 2021-01-14Process control enabled VDC sensor for plasma process
#36 | 2020-09-24System and methods for VHF plasma processing
#37 | 2020-08-27Methods and systems for focus ring thickness determinations and feedback control
#38 | 2020-01-09Resonant structure for electron cyclotron resonant (ECR) plasma ionization
#39 | 2019-11-07Radical source with contained plasma
#40 | 2019-05-16Plasma processing system with synchronized signal modulation
#41 | 2016-03-10Resonant structure for a plasma processing system
#42 | 2015-01-29Radio frequency signal splitter and matcher
#43 | 2014-09-18METHOD AND SYSTEM USING PLASMA TUNING RODS FOR PLASMA PROCESSING
#44 | 2013-05-16Radio frequency (RF) power coupling system utilizing multiple RF power coupling elements for control of plasma properties
#45 | 2012-10-04Adaptive recipe selector
#46 | 2012-10-04Methods of electrical signaling in an ion energy analyzer
#47 | 2012-10-04Ion energy analyzer and methods of manufacturing the same
#48 | 2012-10-04Ion energy analyzer
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