Oberkochen
Germany
149
2019-01-24
The entities that hold a legal rights for patent applications filed by inventor Mann Hans-Juergen:
Hans-Juergen Mann from Oberkochen, DE has applied for patents for these inventions. The list has both pending applications and granted patents:
IMAGING OPTICAL SYSTEM
#2 | 2018-08-09REFLECTIVE OPTICAL ELEMENT AND EUV LITHOGRAPHY APPLIANCE
#3 | 2018-06-14PROJECTION OBJECTIVE FOR MICROLITHOGRAPHY
#4 | 2018-02-01CATADIOPTRIC PROJECTION OBJECTIVE WITH PARALLEL, OFFSET OPTICAL AXES
#5 | 2017-05-25Imaging optical system
#6 | 2016-09-22CATADIOPTRIC PROJECTION OBJECTIVE
#7 | 2016-09-08Anamorphically imaging projection lens system and related optical systems, projection exposure systems and methods
#8 | 2016-07-07Projection objective of a microlithographic projection exposure apparatus
#9 | 2016-01-07IMAGING OPTICAL SYSTEM AND PROJECTION EXPOSURE SYSTEM FOR MICROLITHOGRAPHY
#10 | 2015-12-17Magnifying imaging optical unit and EUV mask inspection system with such an imaging optical unit
#11 | 2015-08-13Catadioptric projection objective with parallel, offset optical axes
#12 | 2015-08-06Imaging optics, microlithography projection exposure apparatus having same and related methods
#13 | 2015-02-26CATADIOPTRIC PROJECTION OBJECTIVE
#14 | 2015-02-26Reflective optical element and EUV lithography appliance
#15 | 2015-02-19Microlithography projection optical system, tool and method of production
#16 | 2015-01-22Microlithographic imaging optical system including multiple mirrors
#17 | 2014-12-25CATADIOPTRIC PROJECTION OBJECTIVE WITH TWO INTERMEDIATE IMAGES AND NO MORE THAN FOUR LENSES BETWEEN THE APERTURE STOP AND IMAGE PLANE
#18 | 2014-12-11Magnifying imaging optical unit and metrology system including same
#19 | 2014-11-06MICROLITHOGRAPHY PROJECTION OPTICAL SYSTEM AND METHOD FOR MANUFACTURING A DEVICE
#20 | 2014-10-30Imaging optical system
#21 | 2014-05-15Imaging optical system and projection exposure system including the same
#22 | 2014-05-01Projection optics for microlithography
#23 | 2014-04-24Immersion catadioptric projection objective having two intermediate images
#24 | 2014-04-17Projection objective for microlithography
#25 | 2014-04-10Catoptric objectives and systems using catoptric objectives
#26 | 2014-03-20Imaging optical system and projection exposure installation for microlithography with an imaging optical system of this type
#27 | 2014-03-13Microlithography projection system with an accessible diaphragm or aperture stop
#28 | 2014-02-06Imaging optical unit for a projection exposure apparatus
#29 | 2014-02-06Imaging optical system and projection exposure system for microlithography
#30 | 2013-12-26Imaging optical system with at most 11.6% of the illuminated surfaces of the pupil plane being obscured
#31 | 2013-11-14Reflective optical element and EUV lithography appliance
#32 | 2013-09-26MAGNIFYING IMAGING OPTICAL UNIT AND METROLOGY SYSTEM COMPRISING SUCH AN IMAGING OPTICAL UNIT
#33 | 2013-09-19Projection objective of a microlithographic projection exposure apparatus designed for EUV and a method of optically adjusting a projection objective
#34 | 2013-05-23Anamorphically imaging projection lens system and related optical systems, projection exposure systems and methods
#35 | 2013-05-16CATADIOPTRIC PROJECTION OBJECTIVE WITH MIRROR GROUP
#36 | 2013-04-11Imaging optical system and projection exposure installation for microlithography including same
#37 | 2013-03-21Imaging optical system
#38 | 2013-03-14Catoptric objectives and systems using catoptric objectives
#39 | 2013-02-28Apparatus for microlithographic projection exposure and apparatus for inspecting a surface of a substrate
#40 | 2013-02-28Imaging optics, microlithography projection exposure apparatus having same and related methods
#41 | 2013-01-31EUV collector
#42 | 2013-01-10Projection objective having mirror elements with reflective coatings
#43 | 2012-11-22Reflective optical element and EUV lithography appliance
#44 | 2012-11-01CATADIOPTRIC PROJECTION OBJECTIVE
#45 | 2012-11-01Catadioptric projection objective including an aspherized plate
#46 | 2012-11-01IMAGING OPTICS
#47 | 2012-10-04Catadioptric projection objective
#48 | 2012-09-20Imaging optical system
#49 | 2012-09-20Combination stop for catoptric projection arrangement
#50 | 2012-09-13Mirror for use in a microlithography projection exposure apparatus
#51 | 2012-09-06Reflective optical imaging system
#52 | 2012-08-16Imaging optics
#53 | 2012-07-26Catoptric objectives and systems using catoptric objectives
#54 | 2012-07-19Optical arrangement and microlithographic projection exposure apparatus including same
#55 | 2012-06-14Imaging optical system and illumination optical system
#56 | 2012-06-07Magnifying imaging optical unit and metrology system including same
#57 | 2012-06-07Magnifying imaging optical unit and metrology system including same
#58 | 2012-05-24Magnifying imaging optical system and metrology system with an imaging optical system of this type
#59 | 2012-04-19Microlithographic projection exposure apparatus
#60 | 2012-03-29Projection objective and projection exposure apparatus with negative back focus of the entry pupil
#61 | 2012-03-22Imaging optics and projection exposure installation for microlithography with an imaging optics
#62 | 2012-03-22IMAGING OPTICS AND PROJECTION EXPOSURE INSTALLATION FOR MICROLITHOGRAPHY WITH AN IMAGING OPTICS OF THIS TYPE
#63 | 2012-03-22Imaging optical system and projection exposure installation for microlithography with an imaging optical system of this type
#64 | 2012-01-12Imaging optics and projection exposure installation for microlithography with an imaging optics
#65 | 2012-01-12Imaging optical system and projection exposure installation for microlithography with an imaging optical system of this type
#66 | 2011-12-01Imaging optical system
#67 | 2011-11-10Catoptric objectives and systems using catoptric objectives
#68 | 2011-10-27Catadioptric projection objective with mirror group
#69 | 2011-10-27Microlithography projection system with an accessible diaphragm or aperture stop
#70 | 2011-09-29Catadioptric projection objective
#71 | 2011-09-22Method and lithography device with a mask reflecting light
#72 | 2011-09-22Reflective optical element, projection system, and projection exposure apparatus
#73 | 2011-09-22Illumination optical system for projection lithography
#74 | 2011-09-22Reflective optical element and EUV lithography appliance
#75 | 2011-09-01Catadioptric projection objective
#76 | 2011-08-18Microlithography projection exposure apparatus having at least two operating states
#77 | 2011-08-18SIX-MIRROR EUV PROJECTION SYSTEM WITH LOW INCIDENCE ANGLES
#78 | 2011-07-07Microlithographic imaging optical system including multiple mirrors
#79 | 2011-06-30Projection optics for microlithography
#80 | 2011-05-26Imaging optics
#81 | 2011-04-21Projection objective for a microlithographic EUV projection exposure apparatus
#82 | 2011-04-14Apparatus for microlithographic projection exposure and apparatus for inspecting a surface of a substrate
#83 | 2011-03-17Projection objective and projection exposure apparatus with negative back focus of the entry pupil
#84 | 2011-02-03Projection objective for microlithography
#85 | 2010-10-21Catadioptric projection objective
#86 | 2010-10-21Imaging optical system and projection exposure system including the same
#87 | 2010-10-07Catadioptric projection objective
#88 | 2010-09-16Catoptric imaging optical system with an arc-shaped object field
#89 | 2010-09-16Imaging optical system and projection exposure system for microlithography
#90 | 2010-09-16Imaging optical system and related installation and method
#91 | 2010-08-19PROJECTION OBJECTIVE FOR MICRLOLITHOGRAPHY HAVING AN OBSCURATED PUPIL
#92 | 2010-08-05Projection objective having mirror elements with reflective coatings
#93 | 2010-06-17Optical imaging device and imaging method for microscopy
#94 | 2010-06-17Projection objective and method for its manufacture
#95 | 2010-06-10Microscope and microscopy method for space-resolved measurement of a predetermined structure, in particular a structure of a lithographic mask
#96 | 2010-06-03Catoptric objectives and systems using catoptric objectives
#97 | 2010-06-03MICROLITHOGRAPHY PROJECTION OPTICAL SYSTEM AND METHOD FOR MANUFACTURING A DEVICE
#98 | 2010-06-03PROJECTION OBJECTIVE
#99 | 2010-02-11METHOD AND APPARATUS FOR PRODUCING AN ELEMENT HAVING AT LEAST ONE FREEFORM SURFACE HAVING A HIGH ACCURACY OF FORM AND A LOW SURFACE ROUGHNESS
#100 | 2010-01-21Catadioptric projection objective
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