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Inventor profile of:

Chris MACK

City:

Austin, Texas

Country:

United States

Published Applications:

28

Last publication date:

2025-02-27

Top Assignees for applications by Chris MACK

The entities that hold a legal rights for patent applications filed by inventor MACK Chris:

FRACTILIA, LLC 25 Austin, TX United States
KLA-TENCOR TECHNOLOGIES CORP. 3 Milpitas, CA United States
Fractilla, LLC 2 Austin, TX United States

Recent patent applications by MACK Chris

Chris MACK from Austin, US has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2025-02-27

US20250069843A1

Detection of Probabilistic Process Windows

#2 | 2024-09-19

US20240312757A1

SYSTEM AND METHOD FOR GENERATING AND ANALYZING ROUGHNESS MEASUREMENTS AND THEIR USE FOR PROCESS MONITORING AND CONTROL

#3 | 2024-08-01

US20240258066A1

Method of Dispositioning and Control of a Semiconductor Manufacturing Process

#4 | 2023-10-12

US20230326711A1

SYSTEM AND METHOD FOR GENERATING AND ANALYZING ROUGHNESS MEASUREMENTS

#5 | 2023-05-04

US20230134093A1

SYSTEM AND METHOD FOR DETERMINING AND/OR PREDICTING UNBIASED PARAMETERS ASSOCIATED WITH SEMICONDUCTOR MEASUREMENTS

#6 | 2022-05-12

US20220146947A1

System and method for generating and analyzing roughness measurements and their use for process monitoring and control

#7 | 2022-03-03

US20220068594A1

Detection of probabilistic process windows

#8 | 2021-10-21

US20210327675A1

System and method for generating and analyzing roughness measurements

#9 | 2021-08-26

US20210265131A1

Edge detection system

#10 | 2021-07-22

US20210225609A1

System and method for predicting stochastic-aware process window and yield and their use for process monitoring and control

#11 | 2021-07-01

US20210202204A1

System and method for low-noise edge detection and its use for process monitoring and control

#12 | 2021-05-13

US20210142977A1

System and method for generating and analyzing roughness measurements and their use for process monitoring and control

#13 | 2021-03-18

US20210082658A1

System and method for generating and analyzing roughness measurements and their use for process monitoring and control

#14 | 2021-03-04

US20210066027A1

System and method for generating and analyzing roughness measurements and their use for process monitoring and control

#15 | 2020-07-02

US20200211813A1

System and method for generating and analyzing roughness measurements

#16 | 2020-04-16

US20200118789A1

Edge detection system

#17 | 2019-09-05

US20190272623A1

Edge detection system and its use for machine learning

#18 | 2019-06-20

US20190187570A1

Edge detection system and its use for optical proximity correction

#19 | 2019-06-20

US20190186909A1

System and method for generating and analyzing roughness measurements and their use for process monitoring and control

#20 | 2019-06-13

US20190180977A1

System and method for generating and analyzing roughness measurements

#21 | 2019-06-13

US20190180976A1

System and method for generating and analyzing roughness measurements

#22 | 2019-05-30

US20190164303A1

System and method for generating and analyzing roughness measurements

#23 | 2019-05-09

US20190139736A1

Edge detection system

#24 | 2019-04-18

US20190113338A1

System and method for removing noise from roughness measurements

#25 | 2019-01-08

US15892080

Edge detection system

#26 | 2015-11-17

US13184565

Methods for improved monitor and control of lithography processes

#27 | 2006-04-27

US20060089741A1

Computer-implemented method and carrier medium configured to generate a set of process parameters and/or a list of potential causes of deviations for a lithography process

#28 | 2005-11-22

US10431133

Computer-implemented method and carrier medium configured to generate a set of process parameters for a lithography process

InventorID:

2481443 ⎘