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Inventor profile of:

Han Wang

City:

Sunnyvale, California

Country:

United States

Published Applications:

7

Last publication date:

2026-05-21

Top Assignees for applications by Han Wang

The entities that hold a legal rights for patent applications filed by inventor Wang Han:

  • Applied Materials, Inc. 6 Santa Clara, CA United States
  • FACEBOOK, INC. 1 Menlo Park, CA United States

Recent patent applications by Wang Han

Han Wang from Sunnyvale, US has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2026-05-21
US20260143984A1
Electricity

SELECTIVE ETCHING OF SILICON-CONTAINING MATERIAL RELATIVE TO METAL-DOPED BORON FILMS

#2 | 2026-05-14
US20260136853A1
Electricity

REMOVING OR PREVENTING RESIDUE SUBSEQUENT TO REPAIRING LOW-K MATERIALS

#3 | 2026-02-19
US20260052921A1
Electricity

DEEP TRENCH ISOLATION ETCHING

#4 | 2025-03-20
US20250095990A1
Electricity

METAL-CONTAINING HARDMASK OPENING METHODS USING BORON-AND-HALOGEN-CONTAINING PRECURSORS

#5 | 2024-08-08
US20240266185A1
Electricity

SELECTIVE ETCHING OF SILICON-CONTAINING MATERIAL RELATIVE TO METAL-DOPED BORON FILMS

#6 | 2023-12-07
US20230395391A1
Electricity

RUTHENIUM CARBIDE FOR DRAM CAPACITOR MOLD PATTERNING

#7 | 2019-05-02
US20190130043A1
Physics

System and method for determination of a digital destination based on a multi-part identifier

InventorID:

2489010 ⎘

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