Sandy Hook, Connecticut
United States
17
2020-05-21
The entities that hold a legal rights for patent applications filed by inventor Dunn Derren N.:
Derren N. Dunn from Sandy Hook, US has applied for patents for these inventions. The list has both pending applications and granted patents:
Automatic generation of via patterns with coordinate-based recurrent neural network (RNN)
#2 | 2020-05-14Mask process aware calibration using mask pattern fidelity inspections
#3 | 2020-05-07Electrical mask validation
#4 | 2020-01-23Modeling post-lithography stochastic critical dimension variation with multi-task neural networks
#5 | 2019-12-12Generative adversarial networks for generating physical design layout patterns
#6 | 2019-12-12Coordinates-based variational autoencoder for generating synthetic via layout patterns
#7 | 2019-12-12Co-modeling post-lithography critical dimensions and post-etch critical dimensions with multi-task neural networks
#8 | 2019-12-05Generating synthetic layout patterns by feedforward neural network based variational autoencoders
#9 | 2019-12-05Automatic generation of via patterns with coordinate-based recurrent neural network (RNN)
#10 | 2019-12-05Generative adversarial networks for generating physical design layout patterns of integrated multi-layers
#11 | 2019-12-05Coordinates-based generative adversarial networks for generating synthetic physical design layout patterns
#12 | 2019-11-14Semiconductor structure for optical validation
#13 | 2019-05-30Electrical mask validation
#14 | 2019-05-30Optical mask validation
#15 | 2010-02-18MEEF reduction by elongation of square shapes
#16 | 2009-07-30Contact Level Mask Layouts By Introducing Anisotropic Sub-Resolution Assist Features
#17 | 2007-03-29PREVENTING DAMAGE TO INTERLEVEL DIELECTRIC
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