Shanghai
China
8
2024-06-06
The entities that hold a legal rights for patent applications filed by inventor Hu Dawei:
Dawei Hu from Shanghai, CN has applied for patents for these inventions. The list has both pending applications and granted patents:
Measurements Of Semiconductor Structures Based On Spectral Differences At Different Process Steps
#2 | 2022-01-25Multi-environment polarized infrared reflectometer for semiconductor metrology
#3 | 2021-09-23Scatterometry based methods and systems for measurement of strain in semiconductor structures
#4 | 2020-09-08Dispersion model for band gap tracking
#5 | 2020-06-25Scatterometry based methods and systems for measurement of strain in semiconductor structures
#6 | 2019-09-10Dispersion model for band gap tracking
#7 | 2019-06-13Measurement methodology of advanced nanostructures
#8 | 2017-03-14Dispersion model for band gap tracking
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