Jae-Eun Park

City:

Fishkill, New York

Country:

United States

Published Applications:

Last publication date:

2019-06-20

Top Assignees for applications by Jae-Eun Park

The entities that hold a legal rights for patent applications filed by inventor Park Jae-Eun:

Jae-Eun Park from Fishkill, US has applied for patents for these inventions. The list has both pending applications and granted patents:

Device authentication using synchronized activity signature comparison

DUAL STRESS LINERS FOR INTEGRATED CIRCUITS

Overlapped stressed liners for improved contacts

Dual layer stress liner for MOSFETS

INTEGRATED CIRCUIT SYSTEM HAVING STRAINED TRANSISTOR

HDP/PECVD methods of fabricating stress nitride structures for field effect transistors

InventorID:

2538760 ⎘