San Jose, California
United States
40
2021-02-04
The entities that hold a legal rights for patent applications filed by inventor Allen Robert D.:
Robert D. Allen from San Jose, US has applied for patents for these inventions. The list has both pending applications and granted patents:
Rechargeable metal halide battery
#2 | 2020-04-16Molecular glasses as rheological modifiers in high-performance polymers
#3 | 2020-03-05Extrudable poly(propylene) compositions
#4 | 2018-03-15Adhesive resins for wafer bonding
#5 | 2017-06-22Method for removing glyphosate from a solution using functionalized polymeric nanoparticles
#6 | 2016-07-14Low temperature adhesive resins for wafer bonding
#7 | 2016-05-12Low temperature adhesive resins for wafer bonding
#8 | 2016-05-12Adhesive resins for wafer bonding
#9 | 2016-05-12Low temperature adhesive resins for wafer bonding
#10 | 2016-03-03Methods and materials for depolymerizing polyesters
#11 | 2015-07-02PHOTO-PATTERNABLE DIELECTRIC MATERIALS AND FORMULATIONS AND METHODS OF USE
#12 | 2015-04-16Methods and materials for depolymerizing polyesters
#13 | 2014-08-28Positive tone organic solvent developed chemically amplified resist
#14 | 2014-04-24Wound dressing
#15 | 2014-04-24Wound dressing
#16 | 2013-05-23Planarization over topography with molecular glass materials
#17 | 2012-08-16Organic graded spin on BARC compositions for high NA lithography
#18 | 2011-05-12Silicon containing coating compositions and methods of use
#19 | 2011-04-07Planarization over topography with molecular glass materials
#20 | 2011-03-03Chemically amplified photoresist composition and process for its use
#21 | 2011-02-24Functionalized carbosilane polymers and photoresist compositions containing the same
#22 | 2011-02-24Method of forming a relief pattern by e-beam lithography using chemical amplification, and derived articles
#23 | 2010-08-19Spin-on antireflective coating for integration of patternable dielectric materials and interconnect structures
#24 | 2010-07-01Graded topcoat materials for immersion lithography
#25 | 2009-11-26Photopatternable dielectric materials for BEOL applications and methods for use
#26 | 2009-09-17Photopatternable dielectric materials for BEOL applications and methods for use
#27 | 2009-07-23Organic graded spin on BARC compositions for high NA lithography
#28 | 2009-03-26FUNCTIONALIZED CARBOSILANE POLYMERS AND PHOTORESIST COMPOSITIONS CONTAINING THE SAME
#29 | 2009-03-26Functionalized carbosilane polymers and photoresist compositions containing the same
#30 | 2009-03-26Functionalized carbosilane polymers and photoresist compositions containing the same
#31 | 2009-03-26FUNCTIONALIZED CARBOSILANE POLYMERS AND PHOTORESIST COMPOSITIONS CONTAINING THE SAME
#32 | 2009-03-26Spin-on antireflective coating for integration of patternable dielectric materials and interconnect structures
#33 | 2008-12-18GRADED TOPCOAT MATERIALS FOR IMMERSION LITHOGRAPHY
#34 | 2008-12-18Graded topcoat materials for immersion lithography
#35 | 2008-11-20Method of use for photopatternable dielectric materials for BEOL applications
#36 | 2008-10-09RELEASE LAYER FOR IMPRINTED PHOTOCATIONICALLY CURED FILMS
#37 | 2008-10-02Release layer for imprinted photocationic curable resins
#38 | 2005-05-19Silicon-containing resist systems with cyclic ketal protecting groups
#39 | 2005-04-28Low-activation energy silicon-containing resist system
#40 | 2005-01-27Underlayer compositions for multilayer lithographic processes
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