Inventor profile of:

Joseph D. Rose

City:

Gilbert, Arizona

Country:

United States

Published Applications:

14

Last publication date:

2024-11-28

Top Assignees for applications by Joseph D. Rose

The entities that hold a legal rights for patent applications filed by inventor Rose Joseph D.:

Recent patent applications by Rose Joseph D.

Joseph D. Rose from Gilbert, US has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2024-11-28
US20240395558A1
Electricity

Chemical Mechanical Planarization Polishing For Shallow Trench Isolation

#2 | 2024-09-05
US20240297049A1
Electricity

High Oxide Removal Rates Shallow Trench Isolation Chemical Mechanical Planarization Compositions

#3 | 2023-06-22
US20230193079A1
Chemistry; metallurgy

Low dishing oxide CMP polishing compositions for shallow trench isolation applications and methods of making thereof

#4 | 2023-01-19
US20230020073A1
Chemistry; metallurgy

High oxide film removal rate shallow trench (STI) chemical mechanical planarization (CMP) polishing

#5 | 2021-10-21
US20210324270A1
Chemistry; metallurgy

Low oxide trench dishing chemical mechanical polishing

#6 | 2021-10-07
US20210309885A1
Chemistry; metallurgy

Low oxide trench dishing chemical mechanical polishing

#7 | 2021-06-17
US20210179890A1
Chemistry; metallurgy

Low oxide trench dishing shallow trench isolation chemical mechanical planarization polishing

#8 | 2020-08-27
US20200270479A1
Chemistry; metallurgy

Shallow Trench Isolation Chemical And Mechanical Polishing Slurry

#9 | 2020-07-30
US20200239736A1
Chemistry; metallurgy

Shallow trench isolation (STI) chemical mechanical planarization (CMP) polishing with tunable silicon oxide and silicon nitride removal rates

#10 | 2020-07-30
US20200239735A1
Chemistry; metallurgy

Shallow trench isolation (STI) chemical mechanical planarization (CMP) polishing with low abrasive concentration and a combination of chemical additives

#11 | 2020-04-30
US20200131404A1
Chemistry; metallurgy

Suppressing SiN removal rates and reducing oxide trench dishing for Shallow Trench Isolation (STI) process

#12 | 2020-03-26
US20200095502A1
Chemistry; metallurgy

High Oxide VS Nitride Selectivity, Low And Uniform Oxide Trench Dishing In Shallow Trench Isolation(STI) Chemical Mechanical Planarization Polishing(CMP)

#13 | 2020-02-13
US20200048551A1
Chemistry; metallurgy

Chemical mechanical planarization composition for polishing oxide materials and method of use thereof

#14 | 2020-02-13
US20200048496A1
Chemistry; metallurgy

Oxide chemical mechanical planarization (CMP) polishing compositions

InventorID:

2642447 ⎘