Inventor profile of:

Wei LEI

City:

Campbell, California

Country:

United States

Published Applications:

19

Last publication date:

2026-06-18

Top Assignees for applications by Wei LEI

The entities that hold a legal rights for patent applications filed by inventor LEI Wei:

Recent patent applications by LEI Wei

Wei LEI from Campbell, US has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2026-06-18
US20260171364A1
Electricity

PASSIVATING MICROWAVE DIELECTRICS FOR SEMICONDUCTOR MANUFACTURING

#2 | 2024-11-28
US20240395614A1
Electricity

Method for Metal Gapfill

#3 | 2024-06-13
US20240194527A1
Electricity

Interlayer for Resistivity Reduction in Metal Deposition Applications

#4 | 2024-05-02
US20240145300A1
Electricity

Buffer Layer for Dielectric Protection in Physical Vapor Deposition Metal Liner Applications

#5 | 2024-03-14
US20240088071A1
Electricity

Methods for forming metal gapfill with low resistivity

#6 | 2023-10-12
US20230326791A1
Electricity

SELF FIELD-SUPPRESSION CVD TUNGSTEN (W) FILL ON PVD W LINER

#7 | 2023-05-04
US20230134230A1
Chemistry; metallurgy

METHODS AND APPARATUS FOR TUNGSTEN GAP FILL

#8 | 2023-03-23
US20230088552A1
Electricity

Top magnets for decreased non-uniformity in PVD

#9 | 2023-01-26
US20230023235A1
Electricity

ENHANCED STRESS TUNING AND INTERFACIAL ADHESION FOR TUNGSTEN (W) GAP FILL

#10 | 2022-12-01
US20220380888A1
Chemistry; metallurgy

Methods for shaping magnetic fields during semiconductor processing

#11 | 2022-10-20
US20220336227A1
Electricity

METHODS FOR CONTROLLING CONTACT RESISTANCE IN COBALT-TITANIUM STRUCTURES

#12 | 2022-10-13
US20220325410A1
Chemistry; metallurgy

GAP FILL METHODS USING CATALYZED DEPOSITION

#13 | 2022-03-03
US20220068709A1
Electricity

Low resistivity tungsten film and method of manufacture

#14 | 2021-10-14
US20210320034A1
Electricity

Methods for selective deposition of tungsten atop a dielectric layer for bottom up gapfill

#15 | 2021-10-14
US20210317570A1
Chemistry; metallurgy

Selective deposition of titanium films

#16 | 2021-09-16
US20210285102A1
Chemistry; metallurgy

GAP FILL METHODS USING CATALYZED DEPOSITION

#17 | 2020-05-07
US20200144073A1
Electricity

Methods and apparatus for controlling contact resistance in cobalt-titanium structures

#18 | 2020-05-07
US20200144056A1
Electricity

METHOD OF FORMING A COBALT LAYER ON A SUBSTRATE

#19 | 2020-03-05
US20200071816A1
Chemistry; metallurgy

METHODS FOR SELECTIVE DEPOSITION USING MOLYBDENUM HEXACARBONYL

InventorID:

2662689 ⎘