Inventor profile of:

Wei D. Wang

City:

San Jose, California

Country:

United States

Published Applications:

13

Last publication date:

2016-03-24

Top Assignees for applications by Wei D. Wang

The entities that hold a legal rights for patent applications filed by inventor Wang Wei D.:

Recent patent applications by Wang Wei D.

Wei D. Wang from San Jose, US has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2016-03-24
US20160086775A1
Electricity

Apparatus and method for depositing electronically conductive pasting material

#2 | 2014-02-13
US20140042016A1
Electricity

Low resistivity tungsten PVD with enhanced ionization and RF power coupling

#3 | 2013-06-06
US20130139878A1
Electricity

USE OF A1 BARRIER LAYER TO PRODUCE HIGH HAZE ZNO FILMS ON GLASS SUBSTRATES

#4 | 2011-12-15
US20110303960A1
Electricity

Semiconductor device with gate electrode stack including low resistivity tungsten and method of forming

#5 | 2010-12-30
US20100330795A1
Chemistry; metallurgy

Krypton sputtering of low resistivity tungsten

#6 | 2009-08-27
US20090215264A1
Electricity

Process for selective growth of films during ECP plating

#7 | 2009-06-04
US20090142512A1
Electricity

Apparatus and method for depositing electrically conductive pasting material

#8 | 2009-02-26
US20090053882A1
Chemistry; metallurgy

Krypton sputtering of thin tungsten layer for integrated circuits

#9 | 2007-03-15
US20070059502A1
Chemistry; metallurgy

Integrated process for sputter deposition of a conductive barrier layer, especially an alloy of ruthenium and tantalum, underlying copper or copper alloy seed layer

#10 | 2006-11-09
US20060251872A1
Performing operations; transporting

Conductive barrier layer, especially an alloy of ruthenium and tantalum and sputter deposition thereof

#11 | 2005-05-31
US10428476
-

Partially filling copper seed layer

#12 | 2005-04-26
US10340564
-

Diffusion enhanced ion plating for copper fill

#13 | 2005-01-04
US10211473
-

Asymmetric rotating sidewall magnet ring for magnetron sputtering

InventorID:

269016 ⎘