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Inventor profile of:

Jungha CHAE

City:

Suwon-si

Country:

South Korea

Published Applications:

20

Last publication date:

2026-04-30

Top Assignees for applications by Jungha CHAE

The entities that hold a legal rights for patent applications filed by inventor CHAE Jungha:

SAMSUNG ELECTRONICS CO., LTD. 17 Suwon-si, South Korea
SAMSUNG ELECTRONICS CO., LTD. 3 Gyeonggi-Do, South Korea
SAMSUNG SDI CO., LTD. 2 Gyeonggi-do, South Korea
Samsung SDI Co., Ltd. 1 Yongin-si, South Korea

Recent patent applications by CHAE Jungha

Jungha CHAE from Suwon-si, KR has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2026-04-30

US20260118751A1

ORGANOMETALLIC COMPOUND, RESIST COMPOSITION COMPRISING THE SAME, AND PATTERN FORMATION METHOD USING THE RESIST COMPOSITION

#2 | 2026-03-05

US20260063990A1

RESIST COMPOSITION AND PATTERN FORMATION METHOD USING THE SAME

#3 | 2026-01-08

US20260010070A1

RESIST COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME

#4 | 2025-11-13

US20250347994A1

RESIST COMPOSITION AND PATTERN FORMATION METHOD USING THE SAME

#5 | 2025-10-30

US20250333553A1

Chemistry; metallurgy

POLYMER, RESIST COMPOSITION INCLUDING THE SAME, AND PATTERN FORMATION METHOD USING THE RESIST COMPOSITION

#6 | 2025-05-08

US20250147419A1

RESIST COMPOSITION AND PATTERN FORMATION METHOD USING THE SAME

#7 | 2025-05-08

US20250147415A1

RESIST COMPOSITION AND METHOD OF FORMING PATTERNS USING THE SAME

#8 | 2025-03-27

US20250102906A1

ORGANOMETALLIC COMPOUND, RESIST COMPOSITION INCLUDING THE SAME AND PATTERN FORMATION METHOD USING THE RESIST COMPOSITION

#9 | 2025-02-06

US20250043046A1

Chemistry; metallurgy

POLYMER, COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING PATTERN USING THE COMPOSITION

#10 | 2024-10-10

US20240337928A1

ORGANIC SALT, PHOTORESIST COMPOSITION INCLUDING THE SAME AND METHOD OF FORMING PATTERN BY USING THE PHOTORESIST PATTERN

#11 | 2024-09-26

US20240319592A1

RESIST COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME

#12 | 2024-07-11

US20240231228A1

RESIST COMPOSITION AND METHOD OF FORMING PATTERN BY USING THE SAME

#13 | 2024-07-11

US20240231223A1

RESIST COMPOSITION AND METHOD OF FORMING PATTERN BY USING THE SAME

#14 | 2024-04-18

US20240124635A1

Chemistry; metallurgy

POLYMER, RESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING PATTERN USING THE RESIST COMPOSITION

#15 | 2024-03-21

US20240094633A1

CARBOXYLATE SALT, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING PATTERN BY USING THE PHOTORESIST COMPOSITION

#16 | 2024-02-08

US20240043592A1

Chemistry; metallurgy

POLYMER, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING PATTERN USING THE PHOTORESIST COMPOSITION

#17 | 2023-06-08

US20230173798A1

Performing operations; transporting

Laminated film, and display device including same

#18 | 2021-08-26

US20210261738A1

Chemistry; metallurgy

Silane compound including fluorine-containing (poly)ether group, composition including the same, film formed from the composition, display device comprising the film, and article comprising the composition

#19 | 2020-05-14

US20200148829A1

Chemistry; metallurgy

Poly(amide-imide) copolymer, composition for preparing same, article including same, and display device including the article

#20 | 2020-04-09

US20200108588A1

Performing operations; transporting

Laminated film and display device including same

InventorID:

2694936 ⎘