Inventor profile of:

Frank STAALS

City:

Eindhoven

Country:

Netherlands

Published Applications:

64

Last publication date:

2024-12-12

Top Assignees for applications by Frank STAALS

The entities that hold a legal rights for patent applications filed by inventor STAALS Frank:

Recent patent applications by STAALS Frank

Frank STAALS from Eindhoven, NL has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2024-12-12
US20240412067A1
Physics

Metrology Apparatus And Method For Determining A Characteristic Of One Or More Structures On A Substrate

#2 | 2024-01-11
US20240012337A1
Physics

Method of determining control parameters of a device manufacturing process

#3 | 2024-01-04
US20240004299A1
Physics

METHOD AND SYSTEM TO MONITOR A PROCESS APPARATUS

#4 | 2023-09-28
US20230305407A1
Physics

METHODS AND PATTERNING DEVICES AND APPARATUSES FOR MEASURING FOCUS PERFORMANCE OF A LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD

#5 | 2023-05-25
US20230161264A1
Physics

Wavefront optimization for tuning scanner based on performance matching

#6 | 2023-02-23
US20230058839A1
Physics

Method of determining control parameters of a device manufacturing process

#7 | 2023-02-09
US20230042759A1
Physics

SEPARATION OF CONTRIBUTIONS TO METROLOGY DATA

#8 | 2023-01-19
US20230021079A1
Physics

Method for controlling a lithographic apparatus and associated apparatuses

#9 | 2022-11-10
US20220357672A1
Physics

METHOD FOR INFERRING A PROCESSING PARAMETER SUCH AS FOCUS AND ASSOCIATED APPARATUSES AND MANUFACTURING METHOD

#10 | 2022-10-27
US20220342319A1
Physics

METHOD FOR DETERMINING CONTRIBUTION TO A FINGERPRINT

#11 | 2022-05-12
US20220146946A1
Physics

Method for controlling a lithographic apparatus and associated apparatuses

#12 | 2022-03-24
US20220091517A1
Physics

Methods and patterning devices and apparatuses for measuring focus performance of a lithographic apparatus, device manufacturing method

#13 | 2021-11-25
US20210364929A1
Physics

Wavefront optimization for tuning scanner based on performance matching

#14 | 2021-11-11
US20210349395A1
Physics

COMPUTATIONAL METROLOGY

#15 | 2021-05-20
US20210149312A1
Physics

Method of determining control parameters of a device manufacturing process

#16 | 2021-04-01
US20210096472A1
Physics

Control method for a scanning exposure apparatus

#17 | 2021-01-21
US20210018847A1
Physics

Methods and apparatus for monitoring a lithographic manufacturing process

#18 | 2021-01-07
US20210003927A1
Physics

Method for determining contribution to a fingerprint

#19 | 2020-11-12
US20200356012A1
Physics

Method for optimization of a lithographic process

#20 | 2020-11-05
US20200348603A1
Physics

Method for controlling a lithographic apparatus and associated apparatuses

#21 | 2020-08-20
US20200264522A1
Physics

Methods and patterning devices and apparatuses for measuring focus performance of a lithographic apparatus, device manufacturing method

#22 | 2020-08-06
US20200249576A1
Physics

Computational metrology

#23 | 2020-07-23
US20200233310A1
Physics

Method and apparatus for determining a fingerprint of a performance parameter

#24 | 2020-05-21
US20200159130A1
Physics

Methods and patterning devices and apparatuses for measuring focus performance of a lithographic apparatus, device manufacturing method

#25 | 2020-05-07
US20200142324A1
Physics

Methods and patterning devices and apparatuses for measuring focus performance of a lithographic apparatus, device manufacturing method

#26 | 2020-04-23
US20200124968A1
Physics

Method and system to monitor a process apparatus

#27 | 2020-01-23
US20200026182A1
Physics

Metrology apparatus and method for determining a characteristic relating to one or more structures on a substrate

#28 | 2020-01-02
US20200004164A1
Physics

Methods and apparatus for monitoring a lithographic manufacturing process

#29 | 2019-12-12
US20190378012A1
Physics

Metrology apparatus and method for determining a characteristic of one or more structures on a substrate

#30 | 2019-12-12
US20190377264A1
Physics

Metrology robustness based on through-wavelength similarity

#31 | 2019-10-24
US20190324371A1
Physics

Method and apparatus for determining a fingerprint of a performance parameter

#32 | 2019-10-17
US20190317412A1
Physics

Method for optimization of a lithographic process

#33 | 2019-09-05
US20190271919A1
Physics

Method for determining contribution to a fingerprint

#34 | 2019-08-08
US20190243259A1
Physics

Level sensor apparatus, method of measuring topographical variation across a substrate, method of measuring variation of a physical parameter related to a lithographic process, and lithographic apparatus

#35 | 2019-06-27
US20190196334A1
Physics

Method and system to monitor a process apparatus

#36 | 2019-06-06
US20190171114A1
Physics

Measurement method, inspection apparatus, patterning device, lithographic system and device manufacturing method

#37 | 2019-05-02
US20190129319A1
Physics

Metrology robustness based on through-wavelength similarity

#38 | 2019-03-21
US20190086810A1
Physics

Separation of contributions to metrology data

#39 | 2019-02-21
US20190056673A1
Physics

Method of calibrating focus measurements, measurement method and metrology apparatus, lithographic system and device manufacturing method

#40 | 2018-08-09
US20180224752A1
Physics

Process window tracker

#41 | 2018-01-11
US20180011398A1
Physics

Method and apparatus for reticle optimization

#42 | 2017-06-08
US20170160648A1
Physics

Method for determining a process window for a lithographic process, associated apparatuses and a computer program

#43 | 2017-06-01
US20170153558A1
Physics

Metrology target, method and apparatus, computer program and lithographic system

#44 | 2017-01-26
US20170023867A1
Physics

Inspection apparatus, inspection method, lithographic apparatus and manufacturing method

#45 | 2016-12-22
US20160370711A1
Physics

Lithographic apparatus with data processing apparatus

#46 | 2016-12-22
US20160370710A1
Physics

Method of metrology, inspection apparatus, lithographic system and device manufacturing method

#47 | 2016-04-21
US20160109812A1
Physics

Lithographic apparatus

#48 | 2014-01-23
US20140022527A1
Physics

Lithographic apparatus

#49 | 2013-06-06
US20130141706A1
Physics

Lithographic method and apparatus

#50 | 2012-09-27
US20120242969A1
Physics

Lithographic apparatus

#51 | 2012-01-19
US20120013879A1
Physics

Lithographic apparatus and device manufacturing method involving a level sensor having multiple projection units and detection units

#52 | 2011-08-18
US20110200922A1
Physics

Calculating a laser metric within a lithographic apparatus and method thereof

#53 | 2011-07-07
US20110164229A1
Physics

Lithographic apparatus, device manufacturing method, and method of applying a pattern to a substrate

#54 | 2011-06-23
US20110153265A1
Physics

Method of measuring properties of dynamic positioning errors in a lithographic apparatus, data processing apparatus, and computer program product

#55 | 2010-08-05
US20100195071A1
Physics

Lithographic apparatus configured to reconstruct an aerial pattern and to compare the reconstructed aerial pattern with an aerial pattern detected by an image sensor

#56 | 2009-10-29
US20090268182A1
Physics

Method of measuring a lithographic projection apparatus

#57 | 2009-10-22
US20090262320A1
Physics

Method and Lithographic Apparatus for Acquiring Height Data Relating to a Substrate Surface

#58 | 2009-10-15
US20090257034A1
Physics

Lithographic apparatus and device manufacturing method

#59 | 2009-09-17
US20090231563A1
Physics

Method and lithographic apparatus for measuring and acquiring height data relating to a substrate surface

#60 | 2009-08-13
US20090201473A1
Physics

Method for determining exposure settings, lithographic exposure apparatus, computer program and data carrier

#61 | 2009-06-18
US20090153821A1
Physics

Lithographic apparatus with adjusted exposure slit shape enabling reduction of focus errors due to substrate topology and device manufacturing method

#62 | 2008-11-06
US20080273183A1
Physics

Image sensor, lithographic apparatus comprising an image sensor and use of an image sensor in a lithographic apparatus

#63 | 2006-06-29
US20060138347A1
Physics

Level sensor, lithographic apparatus and device manufacturing method

#64 | 2005-02-10
US20050030507A1
Physics

Lithographic apparatus, device manufacturing method, and device manufactured thereby

InventorID:

272086 ⎘