Inventor profile of:

Timo Laufer

City:

Stuttgart

Country:

Germany

Published Applications:

17

Last publication date:

2023-01-19

Top Assignees for applications by Timo Laufer

The entities that hold a legal rights for patent applications filed by inventor Laufer Timo:

Recent patent applications by Laufer Timo

Timo Laufer from Stuttgart, DE has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2023-01-19
US20230018331A1
Physics

Device for detecting a temperature, installation for producing an optical element and method for producing an optical element

#2 | 2023-01-12
US20230010705A1
Physics

Projection exposure apparatus for semiconductor lithography

#3 | 2022-09-29
US20220308463A1
Physics

Method for avoiding a degradation of an optical element, projection system, illumination system and projection exposure apparatus

#4 | 2021-09-16
US20210286272A1
Physics

Method for temperature control of a component

#5 | 2020-07-23
US20200233318A1
Physics

Method for temperature control of a component

#6 | 2020-07-09
US20200218159A1
Physics

Method for determining properties of an EUV source

#7 | 2019-10-10
US20190310555A1
Physics

EUV exposure apparatus with reflective elements having reduced influence of temperature variation

#8 | 2019-07-18
US20190219934A1
Physics

Projection exposure apparatus for semiconductor lithography with increased thermal robustness

#9 | 2018-10-18
US20180299784A1
Physics

EUV exposure apparatus with reflective elements having reduced influence of temperature variation

#10 | 2017-11-02
US20170315449A1
Physics

EUV exposure apparatus with reflective elements having reduced influence of temperature variation

#11 | 2016-07-07
US20160195818A1
Physics

EUV exposure apparatus with reflective elements having reduced influence of temperature variation

#12 | 2015-12-03
US20150346612A1
Physics

Optical arrangement in an optical system, in particular in a microlithographic projection exposure apparatus

#13 | 2013-12-26
US20130343422A1
Physics

Lithography apparatus

#14 | 2013-06-06
US20130141707A1
Physics

EUV exposure apparatus with reflective elements having reduced influence of temperature variation

#15 | 2012-06-21
US20120154772A1
Physics

Optical arrangement in an optical system, in particular in a microlithographic projection exposure apparatus

#16 | 2011-09-08
US20110216298A1
Physics

Protection module for EUV lithography apparatus, and EUV lithography apparatus

#17 | 2011-07-28
US20110181851A1
Physics

Temperature-control device for an optical assembly

InventorID:

272091 ⎘