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Inventor profile of:

David DECKERS

City:

Schilde

Country:

Belgium

Published Applications:

6

Last publication date:

2015-09-17

Top Assignees for applications by David DECKERS

The entities that hold a legal rights for patent applications filed by inventor DECKERS David:

  • ASML Netherlands B.V. 6 Veldhoven, Netherlands
  • ASML Netherlands N.V. 1 Veldhoven, Netherlands

Recent patent applications by DECKERS David

David DECKERS from Schilde, BE has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2015-09-17
US20150261100A1
Physics

Alignment measurement system, lithographic apparatus, and a method to determine alignment of in a lithographic apparatus

#2 | 2013-06-06
US20130141723A1
Physics

Alignment mark deformation estimating method, substrate position predicting method, alignment system and lithographic apparatus

#3 | 2012-05-31
US20120133938A1
Physics

Measuring method, apparatus and substrate

#4 | 2012-03-15
US20120062863A1
Physics

Alignment measurement system, lithographic apparatus, and a method to determine alignment in a lithographic apparatus

#5 | 2012-03-08
US20120057159A1
Physics

Alignment mark, substrate, set of patterning devices, and device manufacturing method

#6 | 2011-11-10
US20110273685A1
Physics

PRODUCTION OF AN ALIGNMENT MARK

InventorID:

272132 ⎘

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