Zeilarn
Germany
11
2016-05-12
The entities that hold a legal rights for patent applications filed by inventor HAECKL Walter:
Walter HAECKL from Zeilarn, DE has applied for patents for these inventions. The list has both pending applications and granted patents:
Compositional analysis of a gas or gas stream in a chemical reactor and method for preparing chlorosilanes in a fluidized bed reactor
#2 | 2014-04-17PROCESS FOR HYDROGENATING SILICON TETRACHLORIDE TO TRICHLOROSILANE
#3 | 2014-04-17Reactor and process for endothermic gas phase reaction in a reactor
#4 | 2013-01-10Process for producing polysilicon
#5 | 2012-08-02Process for purifying chlorosilanes by distillation
#6 | 2012-03-15METHOD FOR PRODUCING THIN SILICON RODS
#7 | 2012-03-08Process for producing polycrystalline silicon
#8 | 2011-12-29Semiconductor wafers of silicon and method for their production
#9 | 2011-06-09METHOD FOR PRODUCING A SEMICONDUCTOR WAFER
#10 | 2008-08-07Semiconductor wafers of silicon and method for their production
#11 | 2006-12-21Process for producing silicon semiconductor wafers with defined defect properties, and silicon semiconductor wafers having these defect properties
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