Santa Clara, California
United States
9
2023-11-30
The entities that hold a legal rights for patent applications filed by inventor Guthrie William E.:
William E. Guthrie from Santa Clara, US has applied for patents for these inventions. The list has both pending applications and granted patents:
Method and system for determining a charged particle beam exposure for a local pattern density
#2 | 2023-06-29Method and system of reducing charged particle beam write time
#3 | 2023-04-20METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE FOR A LOCAL PATTERN DENSITY
#4 | 2021-10-07Method and system for determining a charged particle beam exposure for a local pattern density
#5 | 2021-07-08Method and system of reducing charged particle beam write time
#6 | 2021-04-22Method and system of reducing charged particle beam write time
#7 | 2020-11-26Method and system for determining a charged particle beam exposure for a local pattern density
#8 | 2020-08-18Method and system for determining a charged particle beam exposure for a local pattern density
#9 | 2020-06-25Method and system of reducing charged particle beam write time
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