San Jose, California
United States
158
2026-03-10
133
2026-03-10
These are the the leading inventors for applications assigned to D2S, INC.:
D2S, INC. based in San Jose, US has been assigned the rights to these inventions. The list includes both Pending Applications and Patent Grants:
Geometric loading effect correction for lithography
#2 | 2025-11-27METHODS FOR MODELING OF A DESIGN IN RETICLE ENHANCEMENT TECHNOLOGY
#3 | 2025-09-18METHOD FOR COMPUTATIONAL METROLOGY AND INSPECTION FOR PATTERNS TO BE MANUFACTURED ON A SUBSTRATE
#4 | 2025-09-18METHOD FOR RETICLE ENHANCEMENT TECHNOLOGY OF A DESIGN PATTERN TO BE MANUFACTURED ON A SUBSTRATE
#5 | 2025-07-24METHOD AND SYSTEM FOR RETICLE ENHANCEMENT TECHNOLOGY
#6 | 2024-08-29 ✅ Patent 12,340,164 granted on 2025-06-24METHODS AND SYSTEMS FOR RETICLE ENHANCEMENT TECHNOLOGY OF A DESIGN PATTERN TO BE MANUFACTURED ON A SUBSTRATE
#7 | 2024-07-04 ✅ Patent 12,412,017 granted on 2025-09-09METHODS FOR MODELING OF A DESIGN IN RETICLE ENHANCEMENT TECHNOLOGY
#8 | 2024-06-27 ✅ Patent 12,248,242 granted on 2025-03-11Methods and systems for reticle enhancement technology of a design pattern to be manufactured on a substrate
#9 | 2024-06-20 ✅ Patent 12,287,567 granted on 2025-04-29Method and system for reticle enhancement technology
#10 | 2024-03-14MODELING OF A DESIGN IN RETICLE ENHANCEMENT TECHNOLOGY
#11 | 2023-11-30 ✅ Patent 12,243,712 granted on 2025-03-04Method and system for determining a charged particle beam exposure for a local pattern density
#12 | 2023-09-14 ✅ Patent 12,019,973 granted on 2024-06-25Method for reticle enhancement technology of a design pattern to be manufactured on a substrate
#13 | 2023-09-14 ✅ Patent 11,953,824 granted on 2024-04-09Method for reticle enhancement technology of a design pattern to be manufactured on a substrate
#14 | 2023-09-07 ✅ Patent 12,541,634 granted on 2026-02-03ROUTING NON-PREFERRED DIRECTION WIRING LAYERS OF AN INTEGRATED CIRCUIT BY MINIMIZING VIAS BETWEEN THESE LAYERS
#15 | 2023-08-31 ✅ Patent 12,645,858 granted on 2026-06-02GENERATING ROUTES FOR AN INTEGRATED CIRCUIT DESIGN WITH NON-PREFERRED DIRECTION CURVILINEAR WIRING
#16 | 2023-08-31 ✅ Patent 12,626,046 granted on 2026-05-12GENERATING ROUTES FOR AN INTEGRATED CIRCUIT DESIGN WITH NON-PREFERRED DIRECTION CURVILINEAR WIRING
#17 | 2023-08-31 ✅ Patent 12,632,638 granted on 2026-05-19USING PIXEL-BASED DEFINITION OF AN INTEGRATED CIRCUIT DESIGN TO PERFORM MACHINE-TRAINED ROUTING
#18 | 2023-08-31 ✅ Patent 12,614,017 granted on 2026-04-28USING MACHINE LEARNING TO PRODUCE ROUTES
#19 | 2023-08-03 ✅ Patent 11,921,420 granted on 2024-03-05Method and system for reticle enhancement technology
#20 | 2023-07-20 ✅ Patent 12,547,804 granted on 2026-02-10COMPUTING AND DISPLAYING A PREDICTED OVERLAP SHAPE IN AN IC DESIGN BASED ON PREDICTED MANUFACTURING CONTOURS
#21 | 2023-07-20 ✅ Patent 12,475,283 granted on 2025-11-18GENERATING AND DISPLAY AN ANIMATION OF A PREDICTED OVERLAP SHAPE IN AN IC DESIGN
#22 | 2023-06-29 ✅ Patent 12,626,047 granted on 2026-05-12COMPUTING AND DISPLAYING A PREDICTED OVERLAP SHAPE IN AN IC DESIGN BASED ON PREDICTED MISALIGNMENT OF METAL LAYERS
#23 | 2023-06-29 ✅ Patent 11,972,187 granted on 2024-04-30Methods for modeling of a design in reticle enhancement technology
#24 | 2023-06-29 ✅ Patent 11,886,166 granted on 2024-01-30Method and system of reducing charged particle beam write time
#25 | 2023-06-15 ✅ Patent 12,387,029 granted on 2025-08-12COMPUTING PARASITIC VALUES FOR SEMICONDUCTOR DESIGNS
#26 | 2023-06-01 ✅ Patent 12,547,803 granted on 2026-02-10LEVERAGING CONCURRENCY TO IMPROVE INTERACTIVITY WITH AN EDA TOOL
#27 | 2023-04-20METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE FOR A LOCAL PATTERN DENSITY
#28 | 2023-02-09 ✅ Patent 12,340,495 granted on 2025-06-24METHOD FOR COMPUTATIONAL METROLOGY AND INSPECTION FOR PATTERNS TO BE MANUFACTURED ON A SUBSTRATE
#29 | 2023-02-02 ✅ Patent 11,783,110 granted on 2023-10-10Method for reticle enhancement technology of a design pattern to be manufactured on a substrate
#30 | 2023-02-02 ✅ Patent 11,693,306 granted on 2023-07-04Method for reticle enhancement technology of a design pattern to be manufactured on a substrate
#31 | 2023-02-02 ✅ Patent 12,579,353 granted on 2026-03-17COMPUTING PARASITIC VALUES FOR SEMICONDUCTOR DESIGNS
#32 | 2023-01-26 ✅ Patent 12,488,175 granted on 2025-12-02METHODS AND SYSTEMS TO DETERMINE PARASITICS FOR SEMICONDUCTOR OR FLAT PANEL DISPLAY FABRICATION
#33 | 2023-01-26 ✅ Patent 12,499,301 granted on 2025-12-16COMPUTING PARASITIC VALUES FOR SEMICONDUCTOR DESIGNS
#34 | 2022-06-09 ✅ Patent 11,620,425 granted on 2023-04-04Methods for modeling of a design in reticle enhancement technology
#35 | 2022-04-28 ✅ Patent 12,372,864 granted on 2025-07-29METHODS AND SYSTEMS TO DETERMINE SHAPES FOR SEMICONDUCTOR OR FLAT PANEL DISPLAY FABRICATION
#36 | 2021-10-07 ✅ Patent 11,756,765 granted on 2023-09-12Method and system for determining a charged particle beam exposure for a local pattern density
#37 | 2021-07-08 ✅ Patent 11,604,451 granted on 2023-03-14Method and system of reducing charged particle beam write time
#38 | 2021-05-13 ✅ Patent 11,301,610 granted on 2022-04-12Methods for modeling of a design in reticle enhancement technology
#39 | 2021-04-22 ✅ Patent 11,592,802 granted on 2023-02-28Method and system of reducing charged particle beam write time
#40 | 2020-11-26 ✅ Patent 11,062,878 granted on 2021-07-13Method and system for determining a charged particle beam exposure for a local pattern density
#41 | 2020-10-29 ✅ Patent 11,126,085 granted on 2021-09-21Bias correction for lithography
#42 | 2020-09-03 ✅ Patent 10,909,294 granted on 2021-02-02Modeling of a design in reticle enhancement technology
#43 | 2020-08-27 ✅ Patent 11,263,496 granted on 2022-03-01Methods and systems to classify features in electronic designs
#44 | 2020-08-18 ✅ Patent 10,748,744 granted on 2020-08-18Method and system for determining a charged particle beam exposure for a local pattern density
#45 | 2020-06-25 ✅ Patent 10,884,395 granted on 2021-01-05Method and system of reducing charged particle beam write time
#46 | 2020-02-13 ✅ Patent 11,264,206 granted on 2022-03-01Methods and systems for forming a pattern on a surface using multi-beam charged particle beam lithography
#47 | 2020-01-09 ✅ Patent 10,725,383 granted on 2020-07-28Bias correction for lithography
#48 | 2019-08-01METHOD AND SYSTEM FOR FORMING A PATTERN ON A SURFACE USING MULTI-BEAM CHARGED PARTICLE BEAM LITHOGRAPHY
#49 | 2019-06-27 ✅ Patent 10,657,213 granted on 2020-05-19Modeling of a design in reticle enhancement technology
#50 | 2018-12-27METHOD AND SYSTEM FOR FORMING PATTERNS USING CHARGED PARTICLE BEAM LITHOGRAPHY WITH VARIABLE PATTERN DOSAGE
#51 | 2018-04-19 ✅ Patent 10,431,422 granted on 2019-10-01Method and system for dimensional uniformity using charged particle beam lithography
#52 | 2018-03-15 ✅ Patent 10,317,790 granted on 2019-06-11Sub-resolution assist features in semiconductor pattern writing
#53 | 2017-12-28 ✅ Patent 10,444,629 granted on 2019-10-15Bias correction for lithography
#54 | 2017-11-09 ✅ Patent 10,101,648 granted on 2018-10-16Method and system for forming a pattern on a reticle using charged particle beam lithography
#55 | 2017-07-27Method and System for Forming Patterns Using Charged Particle Beam Lithography with Variable Pattern Dosage
#56 | 2017-05-04 ✅ Patent 10,460,071 granted on 2019-10-29Shaped beam lithography including temperature effects
#57 | 2016-11-17 ✅ Patent 10,031,413 granted on 2018-07-24Method and system for forming patterns using charged particle beam lithography
#58 | 2016-10-13 ✅ Patent 9,625,809 granted on 2017-04-18Method and system for forming patterns using charged particle beam lithography with variable pattern dosage
#59 | 2016-09-08 ✅ Patent 9,859,100 granted on 2018-01-02Method and system for dimensional uniformity using charged particle beam lithography
#60 | 2016-09-08 ✅ Patent 9,715,169 granted on 2017-07-25Method and system for forming a pattern on a reticle using charged particle beam lithography
#61 | 2016-08-23 ✅ Patent 9,424,372 granted on 2016-08-23System and method for data path handling, shot count minimization, and proximity effects correction related to mask writing process
#62 | 2016-07-07 ✅ Patent 9,612,530 granted on 2017-04-04Method and system for design of enhanced edge slope patterns for charged particle beam lithography
#63 | 2016-04-14 ✅ Patent 9,448,473 granted on 2016-09-20Method for fracturing and forming a pattern using shaped beam charged particle beam lithography
#64 | 2016-04-05 ✅ Patent 9,305,132 granted on 2016-04-05Approximate calculation of 2D matrix entries via GPU
#65 | 2016-03-08 ✅ Patent 9,280,634 granted on 2016-03-08Regularization method for quantizing lithography masks
#66 | 2016-02-23 ✅ Patent 9,268,900 granted on 2016-02-23Lithography mask functional optimization and spatial frequency analysis
#67 | 2015-11-19 ✅ Patent 9,372,391 granted on 2016-06-21Method and system for forming patterns using charged particle beam lithography with variable pattern dosage
#68 | 2015-09-17 ✅ Patent 9,465,297 granted on 2016-10-11Method and system for forming patterns with charged particle beam lithography
#69 | 2015-09-10 ✅ Patent 10,290,467 granted on 2019-05-14Method and system for forming a pattern on a surface using multi-beam charged particle beam lithography
#70 | 2015-04-16 ✅ Patent 9,164,372 granted on 2015-10-20Method and system for forming non-manhattan patterns using variable shaped beam lithography
#71 | 2015-03-19 ✅ Patent 9,268,214 granted on 2016-02-23Method for forming circular patterns on a surface
#72 | 2015-01-20 ✅ Patent 8,938,696 granted on 2015-01-20Techniques of optical proximity correction using GPU
#73 | 2015-01-15 ✅ Patent 9,274,412 granted on 2016-03-01Method and system for design of a reticle to be manufactured using variable shaped beam lithography
#74 | 2014-12-04 ✅ Patent 9,343,267 granted on 2016-05-17Method and system for dimensional uniformity using charged particle beam lithography
#75 | 2014-12-04METHOD AND SYSTEM FOR FORMING HIGH ACCURACY PATTERNS USING CHARGED PARTICLE BEAM LITHOGRAPHY
#76 | 2014-10-16 ✅ Patent 9,280,631 granted on 2016-03-08Performing OPC on hardware or software platforms with GPU
#77 | 2014-09-18 ✅ Patent 8,949,750 granted on 2015-02-03Method and system for forming a diagonal pattern using charged particle beam lithography
#78 | 2014-09-18 ✅ Patent 8,865,377 granted on 2014-10-21Method and system for forming a diagonal pattern using charged particle beam lithography
#79 | 2014-08-28 ✅ Patent 8,952,546 granted on 2015-02-10Integrated circuit designed and manufactured using diagonal minimum-width patterns
#80 | 2014-08-14 ✅ Patent 9,034,542 granted on 2015-05-19Method and system for forming patterns with charged particle beam lithography
#81 | 2014-08-07 ✅ Patent 9,043,734 granted on 2015-05-26Method and system for forming high accuracy patterns using charged particle beam lithography
#82 | 2014-06-12 ✅ Patent 9,323,140 granted on 2016-04-26Method and system for forming a pattern on a reticle using charged particle beam lithography
#83 | 2014-06-12 ✅ Patent 9,341,936 granted on 2016-05-17Method and system for forming a pattern on a reticle using charged particle beam lithography
#84 | 2014-05-29 ✅ Patent 8,852,831 granted on 2014-10-07Device for manufacturing a surface using character projection lithography with variable magnification
#85 | 2014-05-15 ✅ Patent 8,900,778 granted on 2014-12-02Method for forming circular patterns on a surface
#86 | 2014-05-08METHOD AND SYSTEM FOR DIMENSIONAL UNIFORMITY USING CHARGED PARTICLE BEAM LITHOGRAPHY
#87 | 2014-05-08 ✅ Patent 8,959,463 granted on 2015-02-17Method and system for dimensional uniformity using charged particle beam lithography
#88 | 2014-05-08 ✅ Patent 9,104,109 granted on 2015-08-11Method and system for improving critical dimension uniformity using shaped beam lithography
#89 | 2014-01-09METHOD AND SYSTEM FOR STENCIL DESIGN FOR PARTICLE BEAM WRITING
#90 | 2013-12-19 ✅ Patent 8,828,628 granted on 2014-09-09Method and system for design of a reticle to be manufactured using variable shaped beam lithography
#91 | 2013-11-28 ✅ Patent 8,916,315 granted on 2014-12-23Method for fracturing and forming a pattern using shaped beam charged particle beam lithography
#92 | 2013-11-21 ✅ Patent 8,883,375 granted on 2014-11-11Method and system for forming a pattern using charged particle beam lithography with multiple exposure passes
#93 | 2013-11-21 ✅ Patent 8,771,906 granted on 2014-07-08Method and system for forming a pattern using charged particle beam lithography with multiple exposure passes which expose different surface area
#94 | 2013-11-21 ✅ Patent 8,895,212 granted on 2014-11-25Method and system for forming a pattern using charged particle beam lithography with multiple exposure passes with different dosages
#95 | 2013-11-21 ✅ Patent 9,091,946 granted on 2015-07-28Method and system for forming non-manhattan patterns using variable shaped beam lithography
#96 | 2013-10-31 ✅ Patent 8,669,023 granted on 2014-03-11Method for optical proximity correction of a reticle to be manufactured using shaped beam lithography
#97 | 2013-10-31 ✅ Patent 8,612,901 granted on 2013-12-17Method and system for forming patterns using charged particle beam lithography with multiple exposure passes
#98 | 2013-10-24 ✅ Patent 9,400,857 granted on 2016-07-26Method and system for forming patterns using charged particle beam lithography
#99 | 2013-10-24 ✅ Patent 8,719,739 granted on 2014-05-06Method and system for forming patterns using charged particle beam lithography
#100 | 2013-10-24METHOD AND SYSTEM FOR FORMING PATTERNS USING CHARGED PARTICLE BEAM LITHOGRAPHY
Also check out D2S, Inc.'s (San Jose, United States) applicant profile with 126 patent applications submitted.
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