Daisuke NISHIDE

City:

Miyagi

Country:

Japan

Published Applications:

Last publication date:

2025-12-04

Top Assignees for applications by Daisuke NISHIDE

The entities that hold a legal rights for patent applications filed by inventor NISHIDE Daisuke:

Daisuke NISHIDE from Miyagi, JP has applied for patents for these inventions. The list has both pending applications and granted patents:

PLASMA PROCESSING APPARATUS, POWER SUPPLY SYSTEM, AND ETCHING METHOD

ETCHING METHOD, PLASMA PROCESSING APPARATUS, AND PROCESSING SYSTEM

Substrate processing method and substrate processing apparatus

Substrate processing method, method for manufacturing semiconducor device, and plasma processing apparatus

Etching method, plasma processing apparatus, and processing system

InventorID:

2809573 ⎘