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Inventor profile of:

Christopher J. Leavitt

City:

Gloucester, Massachusetts

Country:

United States

Published Applications:

Last publication date:

2023-09-07

Top Assignees for applications by Christopher J. Leavitt

The entities that hold a legal rights for patent applications filed by inventor Leavitt Christopher J.:

VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC. 13 Gloucester, MA United States
Applied Materials, Inc. 3 Santa Clara, CA United States
VARIAN SEMICONDUTOR EQUIPMENT ASSOCIATES, INC. 1 Gloucester, MA United States
VARIAN SEMICONDUCTOR EQUIPMENT ASSCOCIATES, INC. 1 Gloucester, MA United States
VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES 1 Gloucester, MA United States

Recent patent applications by Leavitt Christopher J.

Christopher J. Leavitt from Gloucester, US has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2023-09-07

US20230282451A1

Electricity

Cover ring to mitigate carbon contamination in plasma doping chamber

#2 | 2021-12-02

US20210375590A1

Electricity

Plasma processing apparatus and techniques

#3 | 2020-11-12

US20200357611A1

Electricity

Plasma processing apparatus and techniques

#4 | 2018-03-29

US20180087148A1

Chemistry; metallurgy

Method Of Improving Ion Beam Quality In A Non-Mass-Analyzed Ion Implantation System

#5 | 2018-03-08

US20180068830A1

Electricity

Boron implanting using a co-gas

#6 | 2017-08-31

US20170247791A1

Chemistry; metallurgy

Method of improving ion beam quality in a non-mass-analyzed ion implantation system

#7 | 2016-06-09

US20160163510A1

Electricity

Boron implanting using a co-gas

#8 | 2015-12-10

US20150354056A1

Chemistry; metallurgy

Method of improving ion beam quality in a non-mass-analyzed ion implantation system

#9 | 2015-04-16

US20150101634A1

Electricity

Method of cleaning an extraction electrode assembly using pulsed biasing

#10 | 2015-01-22

US20150024580A1

Electricity

Method for implant productivity enhancement

#11 | 2013-06-13

US20130146790A1

Electricity

Apparatus and method for charge neutralization during processing of a workpiece

#12 | 2013-05-30

US20130135598A1

Physics

Method and system for controlling critical dimension and roughness in resist features

#13 | 2012-11-08

US20120280140A1

Physics

Method and system for controlling critical dimension and roughness in resist features

#14 | 2012-09-13

US20120228515A1

Electricity

Apparatus and method for maskless patterned implantation

#15 | 2012-07-12

US20120175518A1

Electricity

Technique and apparatus for monitoring ion mass, energy, and angle in processing systems

#16 | 2012-01-05

US20120000421A1

Electricity

CONTROL APPARATUS FOR PLASMA IMMERSION ION IMPLANTATION OF A DIELECTRIC SUBSTRATE

#17 | 2010-10-07

US20100255683A1

Electricity

Plasma processing apparatus

#18 | 2010-06-24

US20100155600A1

Physics

METHOD AND APPARATUS FOR PLASMA DOSE MEASUREMENT

#19 | 2008-07-03

US20080160212A1

Electricity

METHOD AND APPARATUSES FOR PROVIDING ELECTRICAL CONTACT FOR PLASMA PROCESSING APPLICATIONS

InventorID:

281495 ⎘