Gyeonggi-do
South Korea
20
2013-06-13
The entities that hold a legal rights for patent applications filed by inventor You Young-sub:
Young-sub You from Gyeonggi-do, KR has applied for patents for these inventions. The list has both pending applications and granted patents:
Integrated circuit devices including electrode support structures and methods of fabricating the same
#2 | 2010-12-23Method of forming a vertical diode and method of manufacturing a semiconductor device using the same
#3 | 2010-02-25Methods of forming void-free layers in openings of semiconductor substrates
#4 | 2008-12-11METHOD OF FABRICATING IMAGE DEVICE HAVING CAPACITOR AND IMAGE DEVICE FABRICATED THEREBY
#5 | 2008-12-04CMOS IMAGE SENSORS AND METHODS OF FABRICATING SAME
#6 | 2008-11-20METHOD FORMING EPITAXIAL SILICON STRUCTURE
#7 | 2008-08-21Method of forming a vertical diode and method of manufacturing a semiconductor device using the same
#8 | 2007-03-15Recessed gate electrode and method of forming the same and semiconductor device having the recessed gate electrode and method of manufacturing the same
#9 | 2006-10-05APPARATUS FOR MANUFACTURING A SEMICONDUCTOR DEVICE AND METHOD OF FORMING THE SAME
#10 | 2006-07-18Apparatus for manufacturing a semiconductor device
#11 | 2006-07-13Floating gate memory device and method of manufacturing the same
#12 | 2006-05-09Floating gate memory device and method of manufacturing the same
#13 | 2006-04-06Methods of fabricating flash memory devices with floating gates that have reduced seams
#14 | 2006-03-30Methods of forming self-aligned floating gates using multi-etching
#15 | 2006-03-23Method of forming silicon oxynitride layer in semiconductor device and apparatus of forming the same
#16 | 2006-01-05Method of forming a gate structure for a semiconductor device and method of forming a cell gate structure for a non-volatile memory device
#17 | 2005-12-15Methods of forming a gate structure of a non-volatile memory device and apparatus for performing the same
#18 | 2005-12-15Methods of forming void-free layers in openings of semiconductor substrates
#19 | 2005-12-01Method of forming a dielectric layer and method of manufacturing a nonvolatile memory device using the same
#20 | 2005-07-05Method of manufacturing a metal oxide semiconductor transistor
281933 ⎘