Oberkochen
Germany
10
2013-06-13
The entities that hold a legal rights for patent applications filed by inventor Kraus Dieter:
Dieter Kraus from Oberkochen, DE has applied for patents for these inventions. The list has both pending applications and granted patents:
Optical arrangement, in particular projection exposure apparatus for EUV lithography, as well as reflective optical element with reduced contamination
#2 | 2012-04-12METHOD FOR AVOIDING CONTAMINATION AND EUV-LITHOGRAPHY-SYSTEM
#3 | 2011-09-01Detection of contaminating substances in an EUV lithography apparatus
#4 | 2011-03-10CLEANING MODULE AND EUV LITHOGRAPHY DEVICE WITH CLEANING MODULE
#5 | 2010-10-14Mirror for guiding a radiation bundle
#6 | 2010-05-06APPARATUS AND METHOD FOR MEASURING THE OUTGASSING AND EUV LITHOGRAPHY APPARATUS
#7 | 2010-03-25METHOD AND SYSTEM FOR REMOVING CONTAMINANTS FROM A SURFACE
#8 | 2010-02-25EUV lithography apparatus and method for determining the contamination status of an EUV-reflective optical surface
#9 | 2010-02-11Method for cleaning an EUV lithography device, method for measuring the residual gas atmosphere and the contamination and EUV lithography device
#10 | 2009-09-17Optical arrangement, in particular projection exposure apparatus for EUV lithography, as well as reflective optical element with reduced contamination
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