Delft
Netherlands
5
2013-06-13
The entities that hold a legal rights for patent applications filed by inventor Versluis Richard:
Richard Versluis from Delft, NL has applied for patents for these inventions. The list has both pending applications and granted patents:
Optical arrangement, in particular projection exposure apparatus for EUV lithography, as well as reflective optical element with reduced contamination
#2 | 2011-12-22Method and system for thermally conditioning an optical element
#3 | 2010-01-14Gas analyzing system, lithographic apparatus and method of improving a sensitivity of a gas analyzing system
#4 | 2009-09-17Optical arrangement, in particular projection exposure apparatus for EUV lithography, as well as reflective optical element with reduced contamination
#5 | 2008-06-05Gas analyzing system, lithographic apparatus and method of improving a sensitivity of a gas analyzing system
283786 ⎘