Santa Clara, California
United States
23
2025-07-24
The entities that hold a legal rights for patent applications filed by inventor BEVAN MALCOLM J.:
MALCOLM J. BEVAN from Santa Clara, US has applied for patents for these inventions. The list has both pending applications and granted patents:
METHOD AND APPARATUS FOR SELECTIVE DEPOSITION OF DIELECTRIC FILMS
#2 | 2024-11-14TREATMENTS TO ENHANCE MATERIAL STRUCTURES
#3 | 2024-06-13METHODS FOR CALIBRATING AN OPTICAL EMISSION SPECTROMETER
#4 | 2022-12-15Gate all around I/O engineering
#5 | 2022-09-22Film thickness uniformity improvement using edge ring and bias electrode geometry
#6 | 2022-06-09Methods for calibrating an optical emission spectrometer
#7 | 2022-01-27Film thickness uniformity improvement using edge ring and bias electrode geometry
#8 | 2022-01-13PROCESS KIT WITH PROTECTIVE CERAMIC COATINGS FOR HYDROGEN AND NH3 PLASMA APPLICATION
#9 | 2021-07-01Method and apparatus for selective nitridation process
#10 | 2021-05-06Cap oxidation for FinFET formation
#11 | 2021-04-08Gate all around I/O engineering
#12 | 2021-02-11Method and Apparatus for Selective Deposition of Dielectric Films
#13 | 2020-11-05Treatments to enhance material structures
#14 | 2018-07-26Method And Apparatus For Selective Deposition Of Dielectric Films
#15 | 2014-11-20Method and apparatus for single step selective nitridation
#16 | 2014-10-09Method for conformal treatment of dielectric films using inductively coupled plasma
#17 | 2014-09-18Post-Deposition Treatment Methods For Silicon Nitride
#18 | 2013-02-14Method and apparatus for selective nitridation process
#19 | 2013-01-10NH3 containing plasma nitridation of a layer on a substrate
#20 | 2012-08-09In situ vapor phase surface activation of SiO
#21 | 2011-11-17Methods and apparatus for forming nitrogen-containing layers
#22 | 2011-09-08Method and apparatus for single step selective nitridation
#23 | 2010-09-30Methods and apparatus for forming nitrogen-containing layers
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