Berkeley, California
United States
20
2024-05-16
The entities that hold a legal rights for patent applications filed by inventor Hill Andrew V.:
Andrew V. Hill from Berkeley, US has applied for patents for these inventions. The list has both pending applications and granted patents:
Single grab overlay measurement of tall targets
#2 | 2023-12-26Systems and methods for metrology with layer-specific illumination spectra
#3 | 2023-11-09Massive overlay metrology sampling with multiple measurement columns
#4 | 2023-10-12Multi-directional overlay metrology using multiple illumination parameters and isolated imaging
#5 | 2023-10-05SCANNING SCATTEROMETRY OVERLAY METROLOGY
#6 | 2023-08-17Imaging overlay with mutually coherent oblique illumination
#7 | 2023-05-04Moiré scatterometry overlay
#8 | 2022-12-20Parallel scatterometry overlay metrology
#9 | 2022-11-10OBLIQUE ILLUMINATION FOR OVERLAY METROLOGY
#10 | 2022-10-27SYSTEMS AND METHODS FOR ABSOLUTE SAMPLE POSITIONING
#11 | 2022-09-08Multi-field scanning overlay metrology
#12 | 2022-07-07Scanning scatterometry overlay measurement
#13 | 2022-04-12Pupil-plane beam scanning for metrology
#14 | 2022-02-03Grey-mode scanning scatterometry overlay metrology
#15 | 2021-12-02Imaging system for buried metrology targets
#16 | 2021-11-25Measurement modes for overlay
#17 | 2021-08-12Broadband illumination tuning
#18 | 2021-04-01Sensitive optical metrology in scanning and static modes
#19 | 2020-12-31Metrology target for scanning metrology
#20 | 2020-10-22High-brightness illumination source for optical metrology
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