Mountain View, California
United States
76
2026-01-20
The entities that hold a legal rights for patent applications filed by inventor MILLER KEITH A.:
KEITH A. MILLER from Mountain View, US has applied for patents for these inventions. The list has both pending applications and granted patents:
Sputter system with magnet motion source
#2 | 2025-11-20GROUND RETURN PATH FOR WAFER PROCESS CHAMBER
#3 | 2025-10-23DELIVERY OF CONFIGURABLE PULSED VOLTAGE WAVEFORMS FOR SUBSTRATE PROCESSING
#4 | 2025-04-10Novel arc management algorithm of RF generator and Match box for CCP plasma Chambers
#5 | 2024-09-12Arc management algorithm of RF generator and match box for CCP plasma chambers
#6 | 2024-06-27Power Compensation in PVD Chambers
#7 | 2024-04-04BROADBAND SUPPLY CIRCUITRY FOR A PLASMA PROCESSING SYSTEM
#8 | 2023-12-14Methods and apparatus for controlling ion fraction in physical vapor deposition processes
#9 | 2023-05-25High temperature detachable very high frequency (VHF) electrostatic chuck (ESC) for PVD chamber
#10 | 2023-04-20Methods and apparatus for processing a substrate
#11 | 2022-12-29Cleaning of SIN with CCP plasma or RPS clean
#12 | 2022-12-29Cleaning of sin with CCP plasma or RPS clean
#13 | 2022-12-01Methods and apparatus for processing a substrate
#14 | 2022-11-10Waveform shape factor for pulsed PVD power
#15 | 2022-10-27EM SOURCE FOR ENHANCED PLASMA CONTROL
#16 | 2022-09-29METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE
#17 | 2022-09-29METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE
#18 | 2022-09-29Methods and apparatus for passivating a target
#19 | 2022-05-26WAVEFORM SHAPE FACTOR FOR PULSED PVD POWER
#20 | 2022-05-19Isolator ring clamp and physical vapor deposition chamber incorporating same
#21 | 2022-04-28PVD target having self-retained low friction pads
#22 | 2022-01-20Methods and apparatus for controlling ion fraction in physical vapor deposition processes
#23 | 2021-12-23Apparatus for improved anode-cathode ratio for rf chambers
#24 | 2021-12-02HIGH TEMPERATURE AND VACUUM ISOLATION PROCESSING MINI-ENVIRONMENTS
#25 | 2021-10-14METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE
#26 | 2021-10-14Methods and apparatus for passivating a target
#27 | 2021-09-23Heated shield for physical vapor deposition chamber
#28 | 2021-03-11METHODS AND APPARATUS FOR CONTROLLING ION FRACTION IN PHYSICAL VAPOR DEPOSITION PROCESSES
#29 | 2021-02-11SUBSTRATE SUPPORT SYSTEM
#30 | 2021-01-21EM source for enhanced plasma control
#31 | 2020-10-22Gas flow system
#32 | 2020-10-08SHIELD KIT FOR PROCESS CHAMBER
#33 | 2020-10-01SUBSTRATE SUPPORT PEDESTAL
#34 | 2020-09-24TARGET ASSEMBLY SHIELD
#35 | 2020-03-19METHODS AND APPARATUS FOR UNIFORMITY CONTROL IN SELECTIVE PLASMA VAPOR DEPOSITION
#36 | 2019-06-20METHODS AND APPARATUS FOR PHYSICAL VAPOR DEPOSITION
#37 | 2019-03-28Substrate processing chamber having improved process volume sealing
#38 | 2018-06-21Apparatus And Method For Processing Thin Substrates
#39 | 2018-05-24Collimator for use in a physical vapor deposition chamber
#40 | 2018-05-03REMOVABLE SUBSTRATE PLANE STRUCTURE RING
#41 | 2018-01-25Physical vapor deposition (PVD) plasma energy control per dynamic magnetron control
#42 | 2018-01-11DEPOSITION RING AND ELECTROSTATIC CHUCK FOR PHYSICAL VAPOR DEPOSITION CHAMBER
#43 | 2017-09-07Methods and apparatus for controlling ion fraction in physical vapor deposition processes
#44 | 2016-11-24Deposition ring and electrostatic chuck for physical vapor deposition chamber
#45 | 2016-06-16Electrostatic chuck design for high temperature RF applications
#46 | 2016-06-16Apparatus for PVD dielectric deposition
#47 | 2016-03-31Methods and apparatus for thermally treating a substrate
#48 | 2015-12-10COOLED PROCESS TOOL ADAPTER FOR USE IN SUBSTRATE PROCESSING CHAMBERS
#49 | 2015-06-18Physical vapor deposition (PVD) target having low friction pads
#50 | 2015-06-11WAFER PROCESSING DEPOSITION SHIELDING COMPONENTS
#51 | 2015-03-19PVD plasma control using a magnet edge lift mechanism
#52 | 2014-09-18Shutter blade and robot blade with CTE compensation
#53 | 2014-09-18Methods for processing a substrate using multiple substrate support positions
#54 | 2014-09-18PVD target for self-centering process shield
#55 | 2014-09-18Apparatus for gas injection in a physical vapor deposition chamber
#56 | 2014-09-18Method and apparatus for measuring pressure in a physical vapor deposition chamber
#57 | 2014-09-11Sputter source for use in a semiconductor process chamber
#58 | 2014-09-11Physical vapor deposition RF plasma shield deposit control
#59 | 2014-09-11VACUUM CHAMBERS AND COMPONENTS FOR SEMICONDUCTOR SUBSTRATE PROCESSING AND METHODS OF FABRICATION
#60 | 2014-08-07PVD RF DC open/closed loop selectable magnetron
#61 | 2014-07-10Wafer processing deposition shielding components
#62 | 2014-04-17Heated substrate support ring
#63 | 2014-03-06TARGET CENTER POSITIONAL CONSTRAINT FOR PHYSICAL VAPOR DEPOSITION (PVD) PROCESSING SYSTEMS
#64 | 2014-03-06TARGET COOLING FOR PHYSICAL VAPOR DEPOSITION (PVD) PROCESSING SYSTEMS
#65 | 2014-02-13METHOD AND APPARATUS DEPOSITION PROCESS SYNCHRONIZATION
#66 | 2013-12-19Wafer processing deposition shielding components
#67 | 2013-10-03Substrate processing system having symmetric RF distribution and return paths
#68 | 2013-10-03Substrate processing system with mechanically floating target assembly
#69 | 2013-08-01SUBSTRATE CLEANING CHAMBER AND CLEANING AND CONDITIONING METHODS
#70 | 2013-06-20Apparatus for enabling concentricity of plasma dark space
#71 | 2012-08-23Wafer processing deposition shielding components
#72 | 2012-05-03Deposition ring and electrostatic chuck for physical vapor deposition chamber
#73 | 2012-02-09Electrostatic chuck and methods of use thereof
#74 | 2011-12-22Magnetron design for RF/DC physical vapor deposition
#75 | 2011-09-01Physical Vapor Deposition With A Variable Capacitive Tuner and Feedback Circuit
#76 | 2009-10-22WAFER PROCESSING DEPOSITION SHIELDING COMPONENTS
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