Tokyo
Japan
9
2026-04-23
The entities that hold a legal rights for patent applications filed by inventor Yoshikawa Jun:
Jun Yoshikawa from Tokyo, JP has applied for patents for these inventions. The list has both pending applications and granted patents:
METHOD OF FORMING A STRUCTURE INCLUDING SILICON NITRIDE
#2 | 2026-04-02SUSCEPTOR FOR PROCESSING SUBSTRATES
#3 | 2025-08-28HYBRID DUAL FREQUENCY PLASMA METHOD AND APPARATUS FOR DEPOSITION IN PATTERNED FEATURES ON A SUBSTRATE
#4 | 2024-05-16Method of forming an electronic structure using reforming gas, system for performing the method, and structure formed using the method
#5 | 2023-06-29GAS SUPPLY UNIT AND SUBSTRATE PROCESSING APPARATUS INCLUDING GAS SUPPLY UNIT
#6 | 2023-01-05Method of forming an electronic structure using reforming gas, system for performing the method, and structure formed using the method
#7 | 2022-09-22Temperature controlled reaction chamber
#8 | 2021-01-14Plasma device using coaxial waveguide, and substrate treatment method
#9 | 2020-12-17Method of forming an electronic structure using reforming gas, system for performing the method, and structure formed using the method
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