Tigard, Oregon
United States
19
2023-11-16
The entities that hold a legal rights for patent applications filed by inventor Fox Keith:
Keith Fox from Tigard, US has applied for patents for these inventions. The list has both pending applications and granted patents:
PECVD APPARATUS FOR IN-SITU DEPOSITION OF FILM STACKS
#2 | 2022-05-05MULTI-CHANNEL LIQUID DELIVERY SYSTEM FOR ADVANCED SEMICONDUCTOR APPLICATIONS
#3 | 2022-03-03LOW STRESS FILMS FOR ADVANCED SEMICONDUCTOR APPLICATIONS
#4 | 2019-12-12PECVD apparatus for in-situ deposition of film stacks
#5 | 2018-10-25Rapid chamber clean using concurrent in-situ and remote plasma sources
#6 | 2018-10-25Method for depositing high deposition rate, thick tetraethyl orthosilicate film with low compressive stress, high film stability and low shrinkage
#7 | 2015-11-12PECVD DEPOSITION OF SMOOTH SILICON FILMS
#8 | 2015-01-15PECVD apparatus for in-situ deposition of film stacks
#9 | 2014-12-04Tensile stressed doped amorphous silicon
#10 | 2014-02-27PLASMA CLEAN METHOD FOR DEPOSITION CHAMBER
#11 | 2014-01-23Method for deposition of conformal films with catalysis assisted low temperature CVD
#12 | 2013-11-28PECVD deposition of smooth silicon films
#13 | 2013-10-22Methods for forming conductive carbon films by PECVD
#14 | 2013-10-10Post-deposition soft annealing
#15 | 2013-07-04In-situ deposition of film stacks
#16 | 2013-06-20SILICON NITRIDE FILMS FOR SEMICONDUCTOR DEVICE APPLICATIONS
#17 | 2012-06-07PECVD DEPOSITION OF SMOOTH POLYSILICON FILMS
#18 | 2011-09-29Smooth silicon-containing films
#19 | 2011-09-29In-situ deposition of film stacks
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