Nirasaki
Japan
16
2025-05-15
The entities that hold a legal rights for patent applications filed by inventor Asako Ryuichi:
Ryuichi Asako from Nirasaki, JP has applied for patents for these inventions. The list has both pending applications and granted patents:
METHODS FOR FORMING VERTICALLY LAYERED IONIC LIQUID CRYSTAL (ILC) STRUCTURES ON A SEMICONDUCTOR SUBSTRATE
#2 | 2023-07-20SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM
#3 | 2023-07-20Substrate processing method and ionic liquid
#4 | 2023-01-19PATTERN FORMATION METHOD AND PHOTOSENSITIVE HARD MASK
#5 | 2021-11-25Etching method and plasma processing apparatus
#6 | 2018-03-01Manufacturing methods to protect ULK materials from damage during etch processing to obtain desired features
#7 | 2017-10-12Coating formation method and semiconductor device manufacturing method using the coating formation method
#8 | 2017-03-02Method for removing halogen and method for manufacturing semiconductor device
#9 | 2012-05-31Semiconductor device manufacturing apparatus
#10 | 2012-01-05Semiconductor device and semiconductor device manufacturing method
#11 | 2010-04-22Semiconductor device manufacturing method and semiconductor device manufacturing apparatus
#12 | 2009-01-08Method of manufacturing semiconductor device
#13 | 2008-08-14Processing method and storage medium
#14 | 2008-03-06Apparatus for manufacturing a semiconductor device
#15 | 2007-05-31Semiconductor device manufacturing method that recovers damage of the etching target while supplying a predetermined recovery gas
#16 | 2005-02-24Method of processing an organic-film
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