Sunnyvale, California
United States
15
2012-10-04
The entities that hold a legal rights for patent applications filed by inventor Tabery Cyrus E.:
Cyrus E. Tabery from Sunnyvale, US has applied for patents for these inventions. The list has both pending applications and granted patents:
Double and triple gate MOSFET devices and methods for making same
#2 | 2012-07-17Double and triple gate MOSFET devices and methods for making same
#3 | 2012-01-12Mask for forming integrated circuit
#4 | 2009-04-21Method for forming integrated circuit
#5 | 2007-01-30Method of using carbon spacers for critical dimension (CD) reduction
#6 | 2006-08-15Planarizing sacrificial oxide to improve gate critical dimension in semiconductor devices
#7 | 2006-08-01Use of multilayer amorphous carbon ARC stack to eliminate line warpage phenomenon
#8 | 2006-04-18Source and drain protection and stringer-free gate formation in semiconductor devices
#9 | 2006-03-21Use of amorphous carbon for gate patterning
#10 | 2005-04-05Formation of amorphous carbon ARC stack having graded transition between amorphous carbon and ARC material
#11 | 2005-03-29Method for forming multiple fins in a semiconductor device
#12 | 2005-03-22EUV reflective mask having a carbon film and a method of making such a mask
#13 | 2005-03-08Finfet gate formation using reverse trim of dummy gate
#14 | 2005-02-15Method of using amorphous carbon to prevent resist poisoning
#15 | 2005-02-08Amorphous carbon absorber/shifter film for attenuated phase shift mask
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