Eindhoven
Netherlands
15
2022-06-02
The entities that hold a legal rights for patent applications filed by inventor LANDHEER Siebe:
Siebe LANDHEER from Eindhoven, NL has applied for patents for these inventions. The list has both pending applications and granted patents:
Method and system for determining overlay
#2 | 2019-03-21Lithographic apparatus and a method of operating the apparatus
#3 | 2017-10-05Lithographic apparatus and device manufacturing method
#4 | 2017-10-05Lithographic apparatus and a method of operating the apparatus
#5 | 2016-05-05Lithographic apparatus and a method of operating the apparatus
#6 | 2016-02-25Lithographic apparatus and device manufacturing method
#7 | 2015-04-23Lithographic apparatus and a method of operating the apparatus
#8 | 2013-06-27Lithographic Apparatus and Device Manufacturing Method
#9 | 2012-11-01Lithographic apparatus and device manufacturing method
#10 | 2010-11-25Lithographic apparatus and method of operating the apparatus
#11 | 2010-03-18Lithographic apparatus and method of operating the apparatus with a humid gas space between a projection system and a liquid confinement structure
#12 | 2010-03-18Immersion lithographic apparatus with a barrier between a projection system and a liquid confinement structure
#13 | 2009-12-24Lithographic apparatus and method
#14 | 2009-04-23Lithographic apparatus and device manufacturing method
#15 | 2009-03-05Lithographic apparatus and device manufacturing method
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