Tokyo
Japan
21
2012-05-17
The entities that hold a legal rights for patent applications filed by inventor UEDA Mitsuru:
Mitsuru UEDA from Tokyo, JP has applied for patents for these inventions. The list has both pending applications and granted patents:
Liquid crystal polyimide, liquid crystal resin composition containing same, and resin film for semiconductor elements
#2 | 2011-04-28Method for production of polyfunctional compound
#3 | 2011-02-24Method for production of polyfunctional compound
#4 | 2010-06-03RESIN COMPOSITION, CURED PRODUCT AND OPTICAL PARTS
#5 | 2010-03-25LIQUID CRYSTAL COMPOUND, OPTICAL ELEMENT, POLARIZING PLATE, IMAGE DISPLAY APPARATUS, AND OPTICAL RECORDING MATERIAL
#6 | 2009-08-20Polyfunctional compound, optical recording material, optical recording medium, optical recording/reproducing apparatus, optical waveguide material, and photo-alignment film material
#7 | 2009-07-16Method for production of polyfunctional compound
#8 | 2008-10-16Resin composition, cured product and optical parts
#9 | 2007-08-16LOW DIELECTRIC LOSS RESIN, RESIN COMPOSITION, AND THE MANUFACTURING METHOD OF LOW DIELECTRIC LOSS RESIN
#10 | 2007-08-16Calixresorcinarene compounds, photoresist base materials, and compositions thereof
#11 | 2007-05-03Sulfonamide compound, polymer compound, resist material and pattern formation method
#12 | 2007-02-22Catalyst for polycarbonate production and process for producing polycarbonate
#13 | 2006-08-10Aromatic ring polymer and low-dielectric material
#14 | 2006-05-09Pattern-forming material and method of forming pattern
#15 | 2005-12-15Resist material and pattern formation method
#16 | 2005-12-08Photoresist base material, method for purification thereof, and photoresist compositions
#17 | 2005-12-01Resist material and pattern formation method
#18 | 2005-12-01Resist material and pattern formation method
#19 | 2005-08-25Polymer compound, resist material and pattern formation method
#20 | 2005-04-07Polymer compound, resist material and pattern formation method
#21 | 2005-03-17Sulfonamide compound, polymer compound, resist material and pattern formation method
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