Nirasaki
Japan
38
2012-08-02
The entities that hold a legal rights for patent applications filed by inventor Nishimura Eiichi:
Eiichi Nishimura from Nirasaki, JP has applied for patents for these inventions. The list has both pending applications and granted patents:
Substrate processing method
#2 | 2012-07-19ACTUATOR AND SHEET-SHAPED ACTUATOR
#3 | 2012-02-09Substrate cleaning method
#4 | 2012-01-12Plasma processing method and manufacturing method of semiconductor device
#5 | 2011-08-18Method for forming amorphous carbon nitride film, amorphous carbon nitride film, multilayer resist film, method for manufacturing semiconductor device, and storage medium in which control program is stored
#6 | 2011-08-11Semiconductor device manufacturing method and plasma etching apparatus
#7 | 2010-10-28Plasma processing apparatus
#8 | 2010-09-23Substrate processing method
#9 | 2010-09-16Substrate processing method
#10 | 2010-09-16Substrate processing method
#11 | 2010-08-05Dry etching method for silicon nitride film
#12 | 2010-07-08Substrate processing method
#13 | 2010-07-08Fine pattern forming method
#14 | 2010-06-10Method of manufacturing semiconductor device
#15 | 2010-05-27Semiconductor device fabrication method
#16 | 2010-04-08Substrate processing method and substrate processing apparatus for performing a deposition process and calculating a termination time of the deposition process
#17 | 2010-03-18Substrate processing method
#18 | 2010-02-25Substrate processing method
#19 | 2010-01-28Method and apparatus for detecting foreign matter attached to peripheral edge of substrate, and storage medium
#20 | 2009-11-26Forming method of etching mask, control program and program storage medium
#21 | 2009-11-05Substrate processing system
#22 | 2009-10-29Method of forming etching mask, etching method using the etching mask, and method of fabricating semiconductor device including the etching method
#23 | 2009-01-15Substrate processing system and method
#24 | 2009-01-08Method of manufacturing semiconductor device
#25 | 2008-12-11Substrate processing apparatus, substrate processing method and storage medium
#26 | 2008-10-02Substrate processing system and substrate cleaning apparatus including a jetting apparatus
#27 | 2008-09-25Ashing method and apparatus therefor
#28 | 2008-09-04Substrate processing apparatus and focus ring
#29 | 2008-07-31Substrate processing method and substrate processing apparatus
#30 | 2008-07-31Substrate processing method and substrate processing apparatus
#31 | 2008-05-29Manufacturing method of capacitor electrode, manufacturing system of capacitor electrode, and storage medium
#32 | 2008-01-03Substrate processing method and substrate processing apparatus
#33 | 2008-01-03Substrate processing method and substrate processing apparatus
#34 | 2006-10-05Etching method
#35 | 2006-10-05Substrate processing apparatus
#36 | 2006-08-31Method of processing substrate, and method of and program for manufacturing electronic device
#37 | 2006-08-31Method of processing substrate, method of manufacturing solid-state imaging device, method of manufacturing thin film device, and programs for implementing the methods
#38 | 2006-08-24Method of processing substrate, post-chemical mechanical polishing cleaning method, and method of and program for manufacturing electronic device
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