Nirasaki
Japan
15
2014-09-11
The entities that hold a legal rights for patent applications filed by inventor Ohno Hiroki:
Hiroki Ohno from Nirasaki, JP has applied for patents for these inventions. The list has both pending applications and granted patents:
Supercritical drying method for semiconductor substrate and supercritical drying apparatus
#2 | 2014-01-23Substrate processing method and storage medium
#3 | 2013-01-24Supercritical drying method for semiconductor substrate and supercritical drying apparatus
#4 | 2012-12-06Substrate processing method, substrate processing apparatus, and storage medium
#5 | 2012-10-04Supercritical drying method and apparatus for semiconductor substrates
#6 | 2012-07-26Liquid processing method, liquid processing apparatus and storage medium
#7 | 2010-12-09Substrate processing method and substrate processing apparatus
#8 | 2010-08-19Substrate cleaning method, substrate cleaning apparatus, control program, and computer-readable storage medium
#9 | 2008-10-16Substrate cleaning method, substrate cleaning equipment, computer program, and program recording medium
#10 | 2008-06-05Substrate processing apparatus and substrate processing method
#11 | 2008-02-21Substrate cleaning method and computer readable storage medium
#12 | 2007-09-27Substrate processing method and substrate processing apparatus
#13 | 2007-08-02Substrate cleaning apparatus, substrate cleaning method, and medium for recording program used for the method
#14 | 2007-01-25Substrate processing method and substrate processing apparatus
#15 | 2006-06-20Method of removing polymer and apparatus for doing the same
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