Christopher Sears

Method and system of image-forming multi-electron beams

Detection and correction of system responses in real-time

High resolution electron beam apparatus with dual-aperture schemes

ELECTRON SOURCE WITH MAGNETIC SUPPRESSOR ELECTRODE

Electron beam system for inspection and review of 3D devices

Detection and correction of system responses in real-time

Joint electron-optical columns for flood-charging and image-forming in voltage contrast wafer inspections

Deflection array apparatus for multi-electron beam system

Magnetically microfocused electron emission source

High resolution electron energy analyzer

Charge control device for a system with multiple electron beams

Space charge insensitive electron gun designs

Position feedback for multi-beam particle detector

Particle beam inspector with independently-controllable beams

Method and system for edge-of-wafer inspection and review

Multi-column scanning electron microscopy system

Method and system for aberration correction in an electron beam system

Method and system for charge control for imaging floating metal structures on non-conducting substrates

System and method for drift compensation on an electron beam based characterization tool

Field curvature correction for multi-beam inspection systems

Method and system for edge-of-wafer inspection and review

Method and system for aberration correction in an electron beam system

Method and system for reducing charging artifacts in scanning electron microscopy images

Asymmetric electrostatic quadrupole deflector for improved field uniformity

Wafer grounding using localized plasma source

Permanent magnet lens array

Auger elemental identification algorithm

Background reduction system including louver