Inventor profile of:

Daniel Kraehmer

City:

Aalen

Country:

Germany

Published Applications:

19

Last publication date:

2011-05-12

Top Assignees for applications by Daniel Kraehmer

The entities that hold a legal rights for patent applications filed by inventor Kraehmer Daniel:

Recent patent applications by Kraehmer Daniel

Daniel Kraehmer from Aalen, DE has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2011-05-12
US20110109894A1
Physics

Polarization-modulating optical element and method for manufacturing thereof

#2 | 2011-03-24
US20110069296A1
Physics

Microlithographic exposure method as well as a projection exposure system for carrying out the method

#3 | 2010-06-01
US11358119
-

Method for describing, evaluating and improving optical polarization properties of a microlithographic projection exposure apparatus

#4 | 2009-02-12
US20090040496A1
Physics

Microlithographic exposure method as well as a projection exposure system for carrying out the method

#5 | 2008-08-21
US20080198455A1
Physics

Optical System, In Particular Objective Or Illumination System For A Microlithographic Projection Exposure Apparatus

#6 | 2008-02-28
US20080049202A1
Physics

PROJECTION EXPOSURE APPARATUS FOR SEMICONDUCTOR LITHOGRAPHY

#7 | 2008-02-21
US20080043331A1
Physics

Projection objective of a microlithographic projection exposure apparatus

#8 | 2008-01-03
US20080002167A1
Physics

Projection exposure apparatus and method for operating the same

#9 | 2007-10-18
US20070242250A1
Physics

Objective with crystal lenses

#10 | 2007-09-13
US20070211246A1
Physics

Polarization-modulating optical element and method for manufacturing thereof

#11 | 2007-08-23
US20070195423A1
Physics

Projection exposure apparatus

#12 | 2007-01-11
US20070007491A1
Physics

Optical element, in particular for an objective or an illumination system of a microlithographic projection exposure apparatus

#13 | 2006-10-26
US20060238735A1
Physics

Optical system of a projection exposure apparatus

#14 | 2006-05-25
US20060109560A1
Physics

Method of determining lens materials for a projection exposure apparatus

#15 | 2005-09-15
US20050200966A1
Physics

Objective with birefringent lenses

#16 | 2005-07-21
US20050157401A1
Physics

Objective with crystal lenses

#17 | 2005-07-07
US20050146798A1
Physics

Optical system and method for the production of micro-structured components by microlithography

#18 | 2005-07-07
US20050146704A1
Physics

Microlithographic exposure method as well as a projection exposure system for carrying out the method

#19 | 2005-05-05
US20050094268A1
Physics

Optical system with birefringent optical elements

InventorID:

3379671 ⎘