Tokyo
Japan
8
2026-05-14
The entities that hold a legal rights for patent applications filed by inventor Mita Michihiro:
Michihiro Mita from Tokyo, JP has applied for patents for these inventions. The list has both pending applications and granted patents:
RADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING PATTERN, AND ONIUM SALT
#2 | 2026-01-01RADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING PATTERN, AND ONIUM SALT
#3 | 2025-11-27RADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING PATTERN, AND RADIATION-SENSITIVE ACID GENERATOR
#4 | 2025-05-22RADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND RADIATION-SENSITIVE ACID GENERATOR
#5 | 2025-01-02Radiation-Sensitive Composition, Pattern Formation Method, and Photo-Degradable Base
#6 | 2024-09-26RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMATION METHOD, METHOD FOR MANUFACTURING SUBSTRATE, AND COMPOUND
#7 | 2011-09-15RESIST PATTERN COATING AGENT AND RESIST PATTERN FORMING METHOD USING THE SAME
#8 | 2011-05-26RESIST PATTERN COATING AGENT AND RESIST PATTERN-FORMING METHOD
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