Aloha, Oregon
United States
13
2011-06-23
The entities that hold a legal rights for patent applications filed by inventor Thomas Christopher D.:
Christopher D. Thomas from Aloha, US has applied for patents for these inventions. The list has both pending applications and granted patents:
Method For Depositing Gate Metal For CMOS Devices
#2 | 2009-11-12CMOS DEVICE WITH METAL AND SILICIDE GATE ELECTRODES AND A METHOD FOR MAKING IT
#3 | 2008-05-29CMOS device with metal and silicide gate electrodes and a method for making it
#4 | 2008-01-22Semiconductor device using an interconnect
#5 | 2006-08-17Method for making a semiconductor device with a metal gate electrode that is formed on an annealed high-k gate dielectric layer
#6 | 2006-03-02Atomic layer deposition of high quality high-k transition metal and rare earth oxides
#7 | 2006-02-21Seed layer treatment
#8 | 2006-01-12Method for improving electroplating in sub-0.1um interconnects by adjusting immersion conditions
#9 | 2005-12-20Method of electroless introduction of interconnect structures
#10 | 2005-07-07CMOS device with metal and silicide gate electrodes and a method for making it
#11 | 2005-05-26Seed layer treatment
#12 | 2005-01-18Apparatus and method for electroless spray deposition
#13 | 2005-01-13Apparatus and method for electroless spray deposition
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