Robert D. Rathmell

Heated annulus chuck

Heated electrostatic chuck including mechanical clamp capability at high temperature

System for magnetic scanning and correction of an ion beam

Beam current stabilization utilizing gas feed control loop

Ion implantation beam angle calibration

Means to establish orientation of ion beam to wafer and correct angle errors

Electrostatic lens for ion beams

Biased electrostatic deflector

Controlled dose ion implantation

Magnet for scanning ion beams

Device and method for measurement of beam angle and divergence

Dose cup located near bend in final energy filter of serial implanter for closed loop dose control

Hybrid magnetic/electrostatic deflector for ion implantation systems